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Journals

The Half-Life of 209Po : Revisited

Author(s)
Ronald Colle, Ryan P. Fitzgerald, Lizbeth Laureano-Perez
A substantial 25 % error in the then known and accepted (102  5) year half-life of 209Po was reported on in 2007. This error was detected from decay data from

Effects of Lateral Tip Control in CD-AFM Width Metrology

Author(s)
Ronald G. Dixson, Boon Ping Ng, Ndubuisi G. Orji
Critical dimension atomic force microscopes (CD-AFMs) use flared tips and two-dimensional sensing and position control of the tip-sample interaction to enable

Single-Mode Optical Fiber For High-Power, Low-Loss UV Transmission

Author(s)
Daniel H. Slichter, Yves Colombe, Andrew C. Wilson, Dietrich G. Leibfried, David J. Wineland
We report large-mode-area solid-core photonic crystal fibers made from fused silica which resist UV solarization even at relatively high optical powers. Using a

Anion Reorientations in the Superionic Conducting Phase of Na2B12H12

Author(s)
Kristina Verdal, Terrence J. Udovic, Vitalie Stavila, Wan Si NMN Tang, John J. Rush, Alexander V. Skripov
Quasielastic neutron scattering (QENS) methods were used to characterize the reorientational dynamics of the dodecahydro-closo-dodecaborate (B 12H 126u2-^0

IT Pro Conference on Information Systems Governance

Author(s)
Irena Bojanova, D. Richard Kuhn
Approximately 100 IT professionals participated in the 2014 IT Pro Conference on Information Systems Governance, held at the National Institute of Standards and

In Search of Better Pressure Standards

Author(s)
Jay H. Hendricks, Jacob E. Ricker, Patrick F. Egan, Gregory F. Strouse
Based on highly accurate optical interferometry and fundamental quantum calculations, researchers at the National Institute of Standards and Technology (NIST)

Development of an EUVL collector with infrared radiation suppression

Author(s)
Steven E. Grantham, Mike Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Mueller Ulrich, Shayna khatri, Adam Magruder, Charles S. Tarrio
Laser-produced plasma (LPP) sources for extreme ultraviolet lithography (EUVL) systems utilize CO2 lasers operating with wavelength 10.6μm. Since multilayer

Improved measurement capabilities at the NIST EUV Reflectometry Facility

Author(s)
Charles S. Tarrio, Steven E. Grantham, Thomas A. Germer, Jack C. Rife, Thomas B. Lucatorto, Mike Kriese, Yuriy Platonov, Licai Jiang, Jim Rodriguez
The NIST Extreme Ultraviolet (EUV) Reflectometry Facility was designed in the 1990s to accommodate the largest multilayer optics envisioned at that time
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