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Conferences

The EXPRESS Web Server

February 1, 1999

Author(s)

Joshua Lubell, David A. Sauder

The EXPRESS Web Server is a World Wide Web interface for standards developers creating specifications for STEP, the Standard for the Exchange of Product Model

Accurate Wavelength Calibration References for Wavelength Division Multiplexing

February 1, 1999

Author(s)

Sarah L. Gilbert, William C. Swann

NIST has developed transfer standards and high-accuracy internal standards for wavelength calibration in the 1500 nm region.

Erbium/Ytterbium-Codoped Glass Waveguide Laser Producing 170 mW or Output Power at 1540 nm

February 1, 1999

Author(s)

David S. Funk, D. L. Veasey, P. M. Peters, Norman Sanford, N. H. Fontaine, Joseph S. Hayden

Simulated-eye-design Camera for High-Contrast Measurements

January 30, 1999

Author(s)

Edward F. Kelley

Light-measurement instrumentation based upon high-quality charge-coupled-devices (CCD) is currently in use for measuring the characteristics of electronic

Spectral Mapping of Multimode Vertical-Cavity Surface-Emitting Lasers by Near-Field Scanning Optical Microscopy

January 28, 1999

Author(s)

K. J. Knopp, David H. Christensen, G. H. Vander Rhodes, J. M. Pomeroy, B. B. Goldberg, M. S. {Umlat}nl{umlat}

Fourier-Transform Microwave Spectroscopy of Chemical-Warfare Agents and their Synthetic Precursors

January 18, 1999

Author(s)

Angela R. Hight Walker, R D. Suenram, A C. Samuels, J O. Jensen, D Woolard, W Wiebach

Fourier-transform microwave (FTMW) spectroscopy is an established technique for observing the rotational spectra of molecules and complexes in molecular beams

Ultra-Thin Film Dielectric Reliability Characterization

January 15, 1999

Author(s)

John S. Suehle

The reliability of gate oxides is becoming a critical concern as oxide thickness is scaled below 4 nm in future technology nodes. The breakdown detection

A Java-Based Tool for Testing the Interoperable MPI Protocol

January 12, 1999

Author(s)

William L. George, John G. Hagedorn, J E. Devaney

Java and the World Wide Web are used as the basis of a tool that tests conformance with the InteroperableMessage Passing Interface communication protocol. The

Simulated-eye-design Camera for High-contrast Measurements

January 1, 1999

Author(s)

Edward F. Kelley

Light-measurement instrumentation based upon high-quality charge-coupled-devices (CCD) is currently in use for measuring the characteristics of electronic

Traceability in Time and Frequency Metrology

January 1, 1999

Author(s)

Michael A. Lombardi

A Summary of Micro-milling Studies

January 1, 1999

Author(s)

Bradley N. Damazo, Matthew A. Davies, Brian S. Dutterer, Michael Kennedy

The importance of micro-milling grows as the demand for smaller parts within the medical, telecommunications, and aerospace industries increase. Unlike

Polarized Light Scattering Measurements of Roughness, Subsurface Defects, Particles, and Dielectric Layers on Silicon Wafers, ed. by F. Obelleiro, J.L. Rodr{iacute}guez, and T. Wriedt

January 1, 1999

Author(s)

Thomas A. Germer, L Sung

Phase Inversion in Viscoelastic Polybutadiene (Pb) Polyisoprene (Pi) Blends

January 1, 1999

Author(s)

H Jeon, A Nakatani, W Hsu, A Halasa, Charles C. Han

Automation of NIST Frequency Calibrations at Remote Sites,

January 1, 1999

Author(s)

Michael A. Lombardi

Polymeric Materials Interest Group Workshop: Quantitative Determination of Synthetic Polymer Molecular Mass Distribution

January 1, 1999

Author(s)

William E. Wallace

Preliminary report on the NIST molecular mass distribution interlaboratory comparison.

Improved-accuracy Tristimulus Colorimeters Calibrated with Standard Detectors

January 1, 1999

Author(s)

George P. Eppeldauer

Direct Measurement of Slippage Induced by a Polymer Processing Additive

January 1, 1999

Author(s)

Kalman D. Migler, C L. Gettinger, V P. Thalacker, R Conway

Preliminary Accuracy Evaluation of a Cesium Fountain Primary Frequency Standard at NIST

January 1, 1999

Author(s)

Steven R. Jefferts, D M. Meekhof, Jon H. Shirley, Thomas E. Parker

Stress Relaxation of Poly(Ethylene Naphthalate): Isothermal, Isochronal, and Isostructural Responses

January 1, 1999

Author(s)

M L. Cerrada, G B. McKenna

Standard Detector Based Calibration Method for Tristimulus Colorimeters

January 1, 1999

Author(s)

George P. Eppeldauer

NIST Colorimetric Calibration Facility for Displays Colorimeters

January 1, 1999

Author(s)

Steven W. Brown, Yoshihiro Ohno

A facility has been developed at the National Institute of Standards and Technology (NIST) to calibrate color-measuring instruments for displays. The

PARCS: A Primary Atomic Reference Clock in Space

January 1, 1999

Author(s)

Steven R. Jefferts, Thomas P. Heavner, Leo W. Hollberg

Orientation Texture from Polymeric Materials Using Scattering Methods

January 1, 1999

Author(s)

J D. Barnes

Measuring the Geometric Errors of a Hexapod Machine Tool

January 1, 1999

Author(s)

Johannes A. Soons

This paper describes procedures to measure the geometric errors of parallel kinematic machines with a Gough configuration. The procedures are applied to

Measurement Uncertainty and Uncorrected Bias

January 1, 1999

Author(s)

Steven D. Phillips, K Eberhardt, William T. Estler

This paper discusses the distinction between measurement uncertainty, measurement errors and their role in the calibration process. The issue of including

Authenticating Time and Frequency Signals

January 1, 1999

Author(s)

Judah Levine

The Effects of Steady Shear on the Order and Orientation of a Diblock Copolymer Melt using In-Situ Small-Angle Neutron Scattering

January 1, 1999

Author(s)

K A. Barnes, F A. Morrison, A Nakatani, J W. Mays

Microwave Network Analyzers - A Discussion of Verification Methods

January 1, 1999

Author(s)

Ronald A. Ginley

Verification of Vector Network Analyzers (VNAs) is very important to the measurement process as well as to establish confidence in the uncertainty of the system

Measurement Uncertainty and Noise in Nanometrology

January 1, 1999

Author(s)

James E. Potzick

The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of

Broadband optical comb generation with a frequency modulated parametric oscillator, ed. by R. Blatt

January 1, 1999

Author(s)

Scott A. Diddams, L -. Ma, Jun Ye, John L. Hall

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