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Conferences

Use of Transfer Artifacts for Small Force Measurement

Author(s)
Gordon A. Shaw, Jon R. Pratt, Richard S. Gates, Mark Reitsma
In order for the atomic microscope (AFM) to be used in truly quantatitive studies, a basis within the international system of units (SI) must be established. In

Nano- and Atomic-Scale Length Metrology

Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi George Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu
We discuss nano-scale length metrology of linewidth, step height, and line edge roughness (LER). These properties are of growing importance to the function and

Information Modeling and Model Implementation

Author(s)
Yung-Tsun Lee, Charles R. McLean, Yan Luo
Today?s manufacturing industry greatly relies on computer technology to support activities throughout a product?s life cycle. Effective and efficient

Topography Measurements and Applications

Author(s)
Jun-Feng Song, Theodore V. Vorburger
Based on auto- and cross-correlation functions (ACF and CCF), a new surface parameter called profile (or topography) difference, Ds, has been developed for
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