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Electron Microscopy Frontiers: Opportunities and Challenges

The Material Measurement Laboratory at NIST is conducting this planning workshop to identify measurement gaps that are bridgeable with electron microscopy. In this workshop, we have identified three Nationally strategic industries: Beyond CMOS computing, Additive Manufacturing, and Biological and Soft Matter validation. We will hear from these industry leaders on the most pressing metrology problems they face today, as well as problems on the horizon.

Workshop Goals:    

Identify enabling measurements and resources in electron microscopy in order to strengthen Nationally strategic industries in a globally competitive market.

Background:

Electron microscopes are substantial research investments, both in terms of the tooling costs, and in the procurement and hiring lead times, particularly in the Government. The timescale for innovative solutions needed by industry often outpaces the speed of investments in our field. An evaluation of the measurement challenges in the industries where our Nation has a competitive edge is therefore essential to a microscope program’s ability to respond in a timely manner.

 Abstracts for the talks below (PDF)

Wednesday - March 8, 2017 

 

Opening Session 

09:00 

NIST and MML Metrology Overview 

Mike Fasolka 
Material Measurement Laboratory, Acting Director  
National Institute of Standards and Technology 

09:35 

 

Confessions of a former microscopist: What really drives progress in science and technology 

Alexander H. King 
Critical Materials Institute, Director 
The Ames Laboratory 

10:25 

Coffee break 

10:40 

 

Atomic-Scale Analytical Tomography: Taking the Best from (S)TEM and Atom Probe 

Tom Kelly 
Vice President for Innovation and New Technologies 
CAMECA 

11:30 

 

Moderated discussion 

12:00 

Lunch 

 

Session I: Nanoelectronics and High-Performance Computing  

13:00 

 

Transmission Electron Microscopy for Nanoelectronics 

Alain Diebold 
Interim Dean - College of Nanoscale Sciences 
SUNY Polytechnic Institute 

13:40 

 

Title: Transmission Electron Microscopy for Microelectronics Reliability

Brendan Foran
Senior Scientist
The Aerospace Corporation

14:20 

Coffee break + Posters 

14:50 

 

Improving the Resolution, Acquisition Time and Quality of Scanning Microscopy Images Through Computational Rather Than Hardware Means 

Eric Lifshin  
Professor of Nanoscience
SUNY Polytechnic Institute 

15:30 

 

Moderated discussion

16:30 

Day 1 adjourn 

17:30 

 

Happy hour

Thursday - March 9, 2017 

 

Session II: Soft Matter Validation  

09:00 

Validation of CryoEM Atomic Resolution Structure 

Wah Chiu
Distinguished Service Professor, Department of Biochemistry and Molecular Biology 
Baylor College of Medicine  

 

09:40 

Individual-Particle Electron Tomography (IPET): an approach to study flexible soft-/bio-molecular structure and dynamics 

Gary Ren 
Molecular Foundry, Staff Scientist 
Lawrence Berkley National Laboratory 

10:20 

Coffee break 

10:35 

Morphology Characterization and Directing Self-Assembly in Nanostructured Soft Materials 

Chinedum Osuji 
Professor of Chemical & Environmental Engineering  
Yale University 

11:15 

Moderated discussion 

12:15 

Lunch 

 

Session III: Additive Manufacturing   

13:30 

 

Electron-microscopy studies of additively manufactured 17-4PH stainless steel 

Rainer Hebert 
Additive Manufacturing Innovation Center, Director 
University of Connecticut 

14:10 

The role of microscopy on ICME Methods development during the DARPA OM Program 

Alonso Peralta 
M&PE Life Prediction Group, Staff Engineer 
Honeywell Aerospace 

14:50 

Coffee break + Posters 

15:20 

Powder-Bed Additive Manufacturing Modeling and Measurement Challenges 

Ade Makinde 
Manufacturing & Materials Technologies, Principal Engineer 
GE Global Research 

16:00 

Moderated discussion and workshop conclusion 

17:00 

Meeting Adjourn 

Courtyard Gaithersburg Washingtonian Center
204 Boardwalk Place Gaithersburg MD 20878

$199/night (Book By February 14, 2017) Rate includes hotel shuttle to and from NIST

If you are not registered, you will not be allowed on site. Registered attendees will receive security and campus instructions prior to the workshop.

NON U.S. CITIZENS PLEASE NOTE: All foreign national visitors who do not have permanent resident status and who wish to register for the above meeting must supply additional information. Failure to provide this information prior to arrival will result, at a minimum, in significant delays (up to 24 hours) in entering the facility. Authority to gather this information is derived from United States Department of Commerce Department Administrative Order (DAO) number 207-12. When registration is open, the required NIST-1260 form will be available as well. *New Visitor Access Requirement: Effective July 21, 2014, Under the REAL ID Act of 2005, agencies, including NIST, can only accept a state-issued driver's license or identification card for access to federal facilities if issued by states that are REAL ID compliant or have an extension.Click here for a list of alternative identification and further details>>

Created December 22, 2016, Updated July 25, 2018