Kline, R.
, Sunday, D.
, Windover, D.
and Benjamin, B.
(2017),
X-ray Scattering Critical Dimensional Metrology using a Compact X-ray Source for Next Generation Semiconductor Devices, Journal of Micro/Nanolithography, MEMS, and MOEMS
(Accessed April 25, 2024)
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X-ray Scattering Critical Dimensional Metrology using a Compact X-ray Source for Next Generation Semiconductor Devices
Published
Author(s)
, , , Bunday Benjamin
Citation
Journal of Micro/Nanolithography, MEMS, and MOEMS
Pub Type
Journals
Keywords
X-ray scattering, dimensional metrology, semiconductor industry
Citation
Created February 8, 2017, Updated March 27, 2017