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X-ray Scattering Critical Dimensional Metrology using a Compact X-ray Source for Next Generation Semiconductor Devices

Published

Author(s)

Regis J. Kline, Daniel F. Sunday, Donald A. Windover, Bunday Benjamin
Citation
Journal of Micro/Nanolithography, MEMS, and MOEMS

Keywords

X-ray scattering, dimensional metrology, semiconductor industry

Citation

Kline, R. , Sunday, D. , Windover, D. and Benjamin, B. (2017), X-ray Scattering Critical Dimensional Metrology using a Compact X-ray Source for Next Generation Semiconductor Devices, Journal of Micro/Nanolithography, MEMS, and MOEMS (Accessed May 25, 2022)
Created February 8, 2017, Updated March 27, 2017