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Search Publications by: Ronald L. Jones (Fed)

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Displaying 76 - 100 of 149

X-ray Absorption Spectroscopy to Probe Surface Composition and Surface Deprotection in Photoresist Films

March 1, 2005
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Ronald L. Jones, Christopher Soles, Wen-Li Wu, D M. Goldfarb, M Angelopoulos
We utilize near edge x-ray absorption fine structure spectroscopy (NEXAFS) to provide chemical insight into surface chemical effects in model photo-resist films. First, NEXAFS was used to examine the resist/air interface including surface segregration of a

Formation of Deprotected Fuzzy Blobs in Chemically Amplified Resists

September 1, 2004
Author(s)
Ronald L. Jones, C G. Willson, T Hu, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos, B C. Trinque, G M. Schmidt, M D. Stewart
The requirement of nanometer dimensional control in photolithographic patterning underlies the future of emerging technologies including next generation semiconductors, nanofluidics, photonics, and microelectronic machines (MEMs). Dimensional control is

Correlation of the Reaction Front With Roughness in Chemically Amplified Photoresists

July 1, 2004
Author(s)
Ronald L. Jones, Vivek M. Prabhu, D M. Goldfarb, Eric K. Lin, Christopher L. Soles, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Wen-Li Wu, M Angelopoulos
A model bilayer geometry is used to examine fundamental contributions of in-situ reaction front profile width on resulting line edge roughness after development in standard 0.26 N tetramethyl ammonium hydroxide aqueous base developer. The bilayer geometry

Interfacial Effects on Moisture Absorption in Thin Polymer Films

June 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, C M. Wang, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, D L. Goldfarb, M Angelopoulos
Moisture absorption in model photoresist films of poly(4-hydroxystryene) (PHOSt) and poly(tert-butoxycarboxystyrene) (PBOCSt) was measured by x-ray and neutron reflectivity. The degree of swelling in the films upon moisture exposure was found to be

Unusual Expansion and Contraction in Ultrathin Glassy Polycarbonate Films

April 1, 2004
Author(s)
Christopher L. Soles, Jack F. Douglas, Ronald L. Jones, Wen-Li Wu
The thermal expansion behavior and glass transitions of poly(styrene) (PS) and poly(methyl methacrylate) (PMMA) are extensively studied in the thin film geometry. Both PS and PMMA are similar in that they possess very low entanglement densities. In this

Brillouin Scattering Studies of Polymeric Nanostructures

March 1, 2004
Author(s)
R Hartschuh, A Mahorowala, Y Ding, J H. Roh, A Kisliuk, Alexei Sokolov, Christopher Soles, Ronald L. Jones, T J. Hu, Wen-Li Wu
Polymers are now being patterned into nanometer-sized features via optical and/or imprint lithography for a range of applications, including semiconductors, Micro-Electro- Mechanical systems (MEMS), and Nano-Electro-Mechanical systems (NEMS). In these

Water Absorption in Thin Photoresist Films

February 1, 2004
Author(s)
B D. Vogt, Christopher L. Soles, Ronald L. Jones, Vivek M. Prabhu, Wen-Li Wu, Eric K. Lin
In this work, we quantify deviations in the moisture absorption into model photoresist films upon changing thickness. Both the thermodynamics and kinetics of the absorption process are examined. Water in the resist films has been shown to have a

Small Angle X-Ray Scattering for Sub-100 nm Pattern Characterization

November 1, 2003
Author(s)
Ronald L. Jones, T Hu, Eric K. Lin, Wen-Li Wu, R Kolb, D Casa, P J. Bolton, G G. Barclay
The characterization of sub-100 nm photolithographic patterns with nanometer scale resolution is demonstrated using Small Angle X-ray Scattering (SAXS). The transmission scattering geometry employed is capable of high throughput measurements with