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Search Publications by: Ndubuisi George Orji (Fed)

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Displaying 101 - 125 of 155

Towards Accurate Feature Shape Metrology

March 22, 2008
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, B Bunday, J Allgair
Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM) is

Nano- and Atomic-Scale Length Metrology

December 14, 2007
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi G. Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu

Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST

October 1, 2007
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, James E. Potzick, Joseph Fu, Michael W. Cresswell, Richard A. Allen, S J. Smith, Anthony J. Walton
The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology. Two major instruments are being used for traceable measurements. The first is a custom in-house metrology AFM, called the calibrated AFM (C

TEM Calibration Methods for Critical Dimension Standards

April 5, 2007
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, B Bunday, M R. Bishop, Michael W. Cresswell, J Allgair
One of the key challenges in critical dimension (CD) metrology is finding suitable calibration standards. Over the last few years there has been some interest in using features measured with transmission electron microscope (TEM) as primary standards for

Application of Carbon Nanotube Probes in a Critical Dimension Atomic Force Microscope

March 1, 2007
Author(s)
B C. Park, J Choi, S J. Ahn, D H. Kim, L Joon, Ronald G. Dixson, Ndubuisi George Orji, Joseph Fu, Theodore V. Vorburger
The ever decreasing size of semiconductor features demands the advancement of critical dimension atomic force microscope (CD-AFM) technology, for which the fabrication and use of more ideal probes like carbon nanotubes (CNT) is of considerable interest

The Coming of Age of Tilt CD-SEM

March 1, 2007
Author(s)
B Bunday, J Allgair, E Solecky, C Archie, Ndubuisi George Orji
The need for 3D metrology is becoming more urgent to address critical gaps in metrology for both lithographic and etch processes. Current generation lithographic processing (ArF source, where lambda=193 nm) sometimes results in photoresist lines with re

Higher Order Tip Effects in CD-AFM Linewidth Measurements

January 1, 2007
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson
In critical dimension Atomic force microscopy (CD-AFM), a source of uncertainty is the tip. Measurements made using a CD-AFM tip show an apparent broadening of the width. Usually the results can be approximated if the tip-width is known. In addition to tip

Progress on Implementation of a CD-AFM Based Reference Measurement System

March 1, 2006
Author(s)
Ndubuisi G. Orji, Angela Martinez, Ronald G. Dixson, J Allgair
The National Institute of Standards and Technology (NIST) and SEMATECH are working to address traceability issues in semiconductor dimensional metrology. In semiconductor manufacturing, many of the measurements made in the fab are not traceable to the SI

Traceable Atomic Force Microscope Dimensional Metrology at NIST

March 1, 2006
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, Michael W. Cresswell, Richard A. Allen, William F. Guthrie
The National Institute of Standards and Technology (NIST) has a multifaceted program in atomic force microscope (AFM) dimensional metrology. There are two major instruments being used for traceable measurements at NIST. The first is a custom in-house