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Search Publications by: Ndubuisi George Orji (Fed)

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Displaying 76 - 78 of 78

Surface Metrology Software Variability in Two-Dimensional Measurements

January 1, 2003
Author(s)
Ndubuisi G. Orji, Theodore V. Vorburger, Xiaohong Gu, Jayaraman Raja
A range of surface texture measurement instruments is available in the market place. Most of the measurement instruments are microcomputer-based systems that contain their own surface analysis software to evaluate measured roughness profiles. After a

Silicon Single Atom Steps as AFM Height Standards

August 1, 2001
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, Joseph Fu, V W. Tsai, E. C. Williams, Theodore V. Vorburger, H Edwards, D Cook, P West, R Nyffenegger
Atomic force microscopes (AFMs) are used in the semiconductor industry for a variety of metrology purposes. Step height measurements at the nanometer level and roughness measurements at sub-nanometer levels are often of interest. To perform accurate

Atomic Level Surface Metrology

January 1, 2001
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Jun-Feng Song, Thomas Brian Renegar, Joseph Fu, Ndubuisi George Orji, V W. Tsai, E. C. Williams, H Edwards, D Cook, P West, R Nyffenegger
MotivationSemiconductor wafers and many types of optical elementsrequire ultra-smooth surfaces in order to functionas specifiedExamples:Laser gyro mirrors with rms roughness 0.1 nmSilicon gate oxides with thickness 3 nm,rms roughness must be significantly
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