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Search Publications by: John E. Bonevich (Fed)

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Displaying 76 - 91 of 91

Magnetic Anisotropy and Thermal Stability of Ta-pinned Spin Valves

January 1, 2001
Author(s)
R A. Fry, Robert D. McMichael, John E. Bonevich, P J. Chen, William F. Egelhoff Jr., Chang H. Lee
It has recently been found that large uniaxial anisotropy fields in excess of 120 kA/m (1500 Oe) can be created in thin (3 nm to 5 nm) films of Co by obliquely sputtered Ta underlayers. This anisotropy can be used to pin the bottom film of a spin valve

Strong Anisotropy in Thin Magnetic Films Deposited on Obliquely Sputtered Ta Underlayers

November 1, 2000
Author(s)
Robert McMichael, C G. Lee, John E. Bonevich, P J. Chen, W. Wyatt Miller, William F. Egelhoff Jr.
Anisotropy fields in excess of 120 kA/m (1500 Oe) have been produced in 3-5 nm- thick polycrystalline films of Co by oblique sputtering of Ta underlayers. The unusually high anisotropy is magnetostatic in origin, and is induced by corrugations on the

Comparison of Electrical CD Measurements and Cross-Section Lattice-Plane Counts of Sub-Micrometer Features Replicated in (100) Silicon-on-Insulator Material

June 1, 2000
Author(s)
Michael W. Cresswell, John E. Bonevich, T J. Headley, Richard A. Allen, Lucille A. Giannuzzi, Sarah C. Everist, Rathindra Ghoshtagore, Patrick J. Shea
Test structures of the type known as cross-bridge resistors have been patterned in (100) epitaxial silicon material that was seeded on Bonded and Etched-Back silicon-on-Insulator (BESOI) substrates. The electrical CDs (Critical Dimensions) of a limited

Correlation of the optical gap of (Ba,Sr)yTiO 2+y thin films with film composition

June 1, 2000
Author(s)
L D. Rotter, Mark D. Vaudin, John E. Bonevich, Debra L. Kaiser, S 0. Park
A series of (Ba 1-x,Sr x)yTiO 2+y films with a wide range of y and x < 0.07 was grown by metalorganic chemical vapor deposition. The composition of the films was determined by wavelength dispersive x-ray spectrometry. Transmission spectra were measured and

Measuring the Interface Stress: Silver/Nickel Interfaces

November 1, 1999
Author(s)
Daniel Josell, John E. Bonevich, I Shao, R C. Cammarata
Interface stress is a surface thermodynamics quantity associated with the reversible work of elastically straining an internal solid interface. In a multilayered thin film, the combined effect of the interface stress of each interface results in an in

Face-Centered Cubic Titanium: An Artifact in Titanium/Aluminum Multilayers

May 1, 1999
Author(s)
John E. Bonevich, D van Heerden, Daniel Josell
The present investigation is the first comprehensive comparative study of x-ray diffraction (XRD) and transmission electron microscopy (TEM) results to address the important issue of fcc Ti formation in nanoscale multilayers Ti/Al multilayers with 7.2 and

The Growth Kinetics of Nanocrystalline ZnO Colloidal Solutions

September 11, 1998
Author(s)
E M. Wong, John E. Bonevich, P C. Searson
Colloidal chemistry techniques were used to synthesize ZnO particles in the nanometer size regime. Although the synthesis and unique properties of these materials are well known, the kinetics of the growth process are not well understood. The particle

Stability of Multilayer Structures: Capillary Effects

June 1, 1998
Author(s)
Daniel Josell, W Carter, John E. Bonevich
The long term stability of multilayer materials composed of nonreactive, immiscible materials is related to the equilibrium shapes of the individual grains within the layers. These shapes are determined by the free energies and locations of the interfaces

Coercivities Above 10 kOe in CoPd Superlattices

Author(s)
William F. Egelhoff Jr., Cedric J. Powell, L Gan, P J. Chen, H Ettedgui, D Tirosh, Robert D. McMichael, Mark D. Stiles, J Mallett, Alexander J. Shapiro, John E. Bonevich, J H. Judy, Erik B. Svedberg, A. E. Berkowitz
We have achieved excellent grain isolation in CoPd superlattices by using 10 nm Au as both an underlayer and an overlayer and diffusing Au into the grain boundaries by annealing for {approximately equal to} 30 min. at 300 degrees C. The grain isolation

Suppressing of Unidirectional Coupling in Magnetic Tunnel Junctions by Preoxidation: Structural Studies

Author(s)
William F. Egelhoff Jr., Robert D. McMichael, Mark D. Stiles, Cedric J. Powell, John E. Bonevich, M Wormington, D S. Eastwood, B K. Tanner
Pre-oxidation of the bottom electrode prior to deposition of Al_{2}O_{3} or MgO is very effective as a general approach to suppressing the unidirectional coupling that is commonly observed in magnetic tunnel junctions. In this paper, we report structural