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Search Publications by: Thomas A. Germer (Fed)

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Displaying 76 - 100 of 197

Relaxation Behavior of Polymer Structures Fabricated by Nanoimprint Lithography

August 14, 2007
Author(s)
Yifu Ding, Hyun Wook Ro, Thomas A. Germer, Jack F. Douglas, Brian C. Okerberg, Alamgir Karim, Christopher L. Soles
We study the decay of the imprinted polystyrene (PS) patterns under thermal annealing using light diffraction. The first order diffraction intensity from the imprinted gratings was measured as a function of annealing time. Local intensity maximum is

Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications

May 7, 2007
Author(s)
Heather J. Patrick, Thomas A. Germer, Michael W. Cresswell, Richard A. Allen, Ronald G. Dixson, Michael R. Bishop
We use an optical critical dimension technique, matching modeled to measured scatterometry signatures, to obtain critical dimension linewidth on grating targets fabricated using the single-crystal critical dimension reference materials process. The targets

Study of Test Structures for Use as Reference Material in Optical Critical Dimension Applications

March 22, 2007
Author(s)
Richard A. Allen, Heather Patrick, Michael Bishop, Thomas Germer, Ronald G. Dixson, William Gutherie, Michael W. Cresswell
Optical critical dimension (OCD) metrology has rapidly become an important technology in supporting the worldwide semiconductor industry. OCD relies on a combination of measurement and modeling to extract the average dimensions of an array of identical

Hemispherical Imaging of Skin With Polarized Light

January 15, 2007
Author(s)
J C. Ramella-Roman, Bruno Boulbry, Thomas A. Germer
Polarized light imaging has been used in the past for skin-cancer edge detection from skin lesions. In the standard imaging modality, the source, detector, and sample are usually aligned in the same plane, and the effect of the air-skin boundary is

Fundamental Limits of Optical Critical Dimension Metrology: A Simulation Study

January 1, 2007
Author(s)
Richard M. Silver, Thomas A. Germer, Ravikiran Attota, Bryan M. Barnes, B Bunday, J Allgair, Egon Marx, Jay S. Jun
This paper is a comprehensive summary and analysis of a SEMATECH funded project to study the limits of optical critical dimension scatterometry. The project was focused on two primary elements: 1) the comparison, stability, and validity of industry models

Spectroscopic phase-dispersion optical coherence tomography measurements of scattering phantoms

September 4, 2006
Author(s)
Shellee D. Dyer, Tasshi Dennis, Lara Roberson, Shelley M. Etzel, Thomas Germer, Andrew Dienstfrey
We demonstrate a novel technique to determine the size of Mie scatterers with high sensitivity. Our technique is based on spectral domain optical coherence tomography measurements of the phase dispersion that is induced by the scattering process. We use

Simulations of Optical Microscope Images

July 3, 2006
Author(s)
Thomas A. Germer, Egon Marx
The resolution of an optical microscope is limited by the optical wavelengths used. However, there is no fundamental limit to the sensitivity of a microscope to small differences in any of a feature's dimensions. That is, those limits are determined by

High Sensitivity Measurements of the Scattering Dispersion of Phantoms using Spectral Domain Optical Coherence Tomography

January 26, 2006
Author(s)
Shellee D. Dyer, Tasshi Dennis, Paul A. Williams, Lara Roberson, Shelley M. Etzel, Robert J. Espejo, Thomas Germer, T E. Milner
We demonstrate a novel technique to determine the size of Mie scatterers with high sensitivity. Our technique is based on spectral domain optical coherence tomography measurements of the dispersion that is induced by the scattering process. We use both Mie

Measuring Interfacial Roughness by Polarized Optical Scattering

October 10, 2005
Author(s)
Thomas A. Germer
Polarized optical scatter measurements yield information that can be used to identify sources of scatter. In this chapter, we review measurements of angle-resolved polarized optical scattering and their application to the measurement of roughness of

High-resolution Optical Metrology

May 1, 2005
Author(s)
Richard M. Silver, Ravikiran Attota, Michael T. Stocker, M R. Bishop, Lowell P. Howard, Thomas A. Germer, Egon Marx, M P. Davidson, Robert D. Larrabee
Recent advances in optical imaging techniques have unveiled new possibilities for optical metrology and optical-based process control measurements of features in the 65 nm node and beyond. In this paper we discuss methods and applications that combine

Out-of-Plane Polarimetric Imaging of Skin: Surface and Subsurface Effects

April 4, 2005
Author(s)
J C. Ramella-Roman, D Duncan, Thomas A. Germer
True borders of certain skin cancers are hard to detect by the human eye. For this reason, techniques such as polarized light imaging have been used to enhance skin cancer contrast before Mohs surgery procedures. In standard polarized light imaging the
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