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Upper roughness limitations on the TIS/RMS relationship

Published

Author(s)

J C. Stover, Sven Schroeder, Thomas Germer

Abstract

The relationship between total integrated scatter (TIS) and root mean square (rms) roughness was developed in the radar literature and enabled the first use of scatter measurements to monitor optical roughness. This relationship has been used and misused ever since. Its most common form makes use of a smooth surface approximation and has been applied to optical surfaces now for half a century. It has been suggested that Davies' exponential form can be applied to much rougher surfaces. This paper investigates that issue through a combination of approximate and rigorous calculations made on optically deep sinusoidal gratings and a few measurements.
Proceedings Title
Reflection, Scattering, and Diffraction from Surfaces III
Volume
8495
Conference Dates
August 13-16, 2012
Conference Location
San Diego, CA, US

Keywords

roughness, scatter, sinusoidal gratings, total integrated scatter

Citation

Stover, J. , Schroeder, S. and Germer, T. (2012), Upper roughness limitations on the TIS/RMS relationship, Reflection, Scattering, and Diffraction from Surfaces III, San Diego, CA, US, [online], https://doi.org/10.1117/12.930770 (Accessed April 21, 2024)
Created September 26, 2012, Updated October 12, 2021