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Displaying 1 - 25 of 66

Nanomanufacturing of Atom-Based Dimensional Standards - A Final Project Report of the NAMT

January 1, 2002
Author(s)
Robert Allen, J J. Pellegrino, D Monk, E C. Teague, Dennis A. Swyt, Joseph Fu, Richard M. Silver, Theodore V. Vorburger, Bradley N. Damazo, Robert Russell, Thomas E. Wheatley, Keith A. Stouffer, Manfred Osti, David Wilmering, Richard L. Rhorer, Ram D. Sriram
This report describes the accomplishments of the Nanomanufacturing of Atom-based Dimensional Standards Project, which operated as part of the National Advanced Manufacturing Testbed (NAMT) a program formally operating from fiscal year (FY) 1996 to FY 2000

Molecular Measuring Machine Design and Performance

January 1, 2001
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E C. Teague
We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microscope

Report of the NIST MEL Architecture Task Force

December 29, 2000
Author(s)
Harry A. Scott, John Evans, Steven R. Ray, E C. Teague, James S. Albus, Herbert T. Bandy, Edward J. Barkmeyer Jr., Neil Christopher, M A. Donmez, Hui-Min Huang, Albert W. Jones, Elena R. Messina, Jim G. Nell, Frederick M. Proctor, Evan K. Wallace
The NIST Manufacturing Engineering Laboratory undertook a series of internal working meetings to examine all of its architecture efforts. A survey of work was performed, and recommendations were identified. This document, initially compiled in 1999

Molecular Measuring Machine Design and Measurements

May 1, 2000
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at the National Institute of Standards and Technology are building a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing nanometer-accuracy, two-dimensional, point-to-point measurements over a 50 mm by 50 mm area

An Overview of Nano-Micro-Meso Scale Manufacturing at the NIST

March 13, 2000
Author(s)
E Amatucci, Nicholas Dagalakis, Bradley N. Damazo, Matthew A. Davies, John Evans, Jun-Feng Song, E C. Teague, Theodore V. Vorburger
The future of nano-, micro- and meso-scale manufacturing operations will be strongly influenced by a new breed of assembly and manufacturing tools that will be intelligent, flexible, more precise, include in-process production technologies and make use of

An Overview of Nano-Micro-Meso Scale Manufacturing at NIST

January 1, 2000
Author(s)
E C. Teague, Jun-Feng Song, Bradley N. Damazo, John Evans, Matthew A. Davies, Nicholas G. Dagalakis
The Manufacturing Engineering Laboratory (MEL) has a unique mission of discrete part manufacturing technology within the National Institute of Standards and Technology''s (NIST) mission of measurement, standards, data and infrastructure technology. Several

A New Method to Measure the Distance Between Graduation Lines on Graduated Scales

December 1, 1999
Author(s)
William B. Penzes, Robert Allen, Michael W. Cresswell, L Linholm, E C. Teague
Line scales are used throughout industry for a variety of applications. The most common is the stage micrometer, a small graduated glass scale for the calibration of optical instruments such as microscopes. However, stage micrometers are generally not

Grating Pitch Measurements With the Molecular Measuring Machine

November 1, 1999
Author(s)
John A. Kramar, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
At the National Institute of Standards and Technology, we are building a metrology instrument called the Molecular Measuring Machine (M^3) with the goal of performing nanometer- accuracy two-dimensional feature placement measurements over a 50 mm by 50 mm

Toward Nanometer Accuracy Measurements

June 1, 1999
Author(s)
John A. Kramar, E Amatucci, David E. Gilsinn, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneling

Collaborating on the Design and Manufacture of an Atomic Artifact Transport System: A Case Study in VRML as a Visualization Tool for Consensus Building

September 1, 1998
Author(s)
Robert Allen, Srinivas Nidamarthi, P V. Rao, Richard L. Rhorer, Ram D. Sriram, E C. Teague
We report on our experience using the Virtual Reality Markup Language (VRML) to collaborate on the design and manufacture of an artifact transport system (ATS). Specifically designed for the purpose of transporting nanometer-scale dimensional artifacts at