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Molecular Measuring Machine Design and Performance

Published

Author(s)

John A. Kramar, Jay S. Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E C. Teague

Abstract

We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microscope probe and the Michelson interferometer metric both have sub-nanometer resolution. M3 operates in a vacuum of 10<sup>-5</sup> Pa and at a temperature of 20 ? 0.005?C. We have measured the pitch of a one-dimensional grating produced by laser-focused atomic deposition of Cr. The average line pitch was 212.69 nm, with an estimated standard uncertainty of 5 pm, compared with a predicted value of 212.78 ? 0.01 nm. Measurements were also made of the surface lattice parameters of the organic conductor (TEET)[Ni(dmit)2]2. Initial small-area measurements were in agreement with the x-ray-crystallography-measured lattice constants of 1.02 nm and 0.75 nm to within 70 pm.
Proceedings Title
Proceedings of the American Society for Precision Engineering
Volume
25
Conference Dates
November 1, 2001
Conference Location
Arlington, VA
Conference Title
American Society for Precision Engineering

Keywords

atom-based standards, dimensional metrology, Michelson interferometry, scanning tunneling microscopy

Citation

Kramar, J. , Jun, J. , Penzes, W. , Scheuerman, V. , Scire, F. and Teague, E. (2001), Molecular Measuring Machine Design and Performance, Proceedings of the American Society for Precision Engineering, Arlington, VA (Accessed June 18, 2024)

Issues

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Created January 1, 2001, Updated February 19, 2017