Molecular Measuring Machine Design and Performance
John A. Kramar, Jay S. Jun, William B. Penzes, Vincent P. Scheuerman, Fredric Scire, E C. Teague
We have developed a metrology instrument called the Molecular Measuring Machine (M3) with the goal of performing two-dimensional point-to-point measurements with nanometer-level uncertainties over a 50 mm by 50 mm area. The scanning tunneling microscope probe and the Michelson interferometer metric both have sub-nanometer resolution. M3 operates in a vacuum of 10<sup>-5</sup> Pa and at a temperature of 20 ? 0.005?C. We have measured the pitch of a one-dimensional grating produced by laser-focused atomic deposition of Cr. The average line pitch was 212.69 nm, with an estimated standard uncertainty of 5 pm, compared with a predicted value of 212.78 ? 0.01 nm. Measurements were also made of the surface lattice parameters of the organic conductor (TEET)[Ni(dmit)2]2. Initial small-area measurements were in agreement with the x-ray-crystallography-measured lattice constants of 1.02 nm and 0.75 nm to within 70 pm.
Proceedings of the American Society for Precision Engineering
, Jun, J.
, Penzes, W.
, Scheuerman, V.
, Scire, F.
and Teague, E.
Molecular Measuring Machine Design and Performance, Proceedings of the American Society for Precision Engineering, Arlington, VA
(Accessed November 28, 2023)