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Displaying 1976 - 2000 of 2177

On the Dynamics of Chip Formation in Machining Hard Metals

January 1, 1997
Author(s)
Matthew A. Davies, Timothy J. Burns, Christopher J. Evans
The results of orthogonal cutting tests on electroplated Nickel-Phosphorus (15% phosphorus) and AISI 52100 bearing steel are presented and compared. For both materials, chips become segmented at relatively low cutting speeds (0.3 m/s to 2 m/s) due to the

Photogrammetric Reconstruction of Petroglyphs

January 1, 1997
Author(s)
Russell A. Kirsch
Viewing rock art is a complex experience, just as is viewing any ohter art form. This experience may include knowledge of the site location, its time of creation, co-occurence with other rock art, stylistic correspondences (Kirsch 1996), and many other

Pitch and Step Height Measurements Using NIST

January 1, 1997
Author(s)
R Koning, Ronald G. Dixson, Joseph Fu, V W. Tsai, Theodore V. Vorburger, Edwin R. Williams, X Wang
The use of the atomic force microscope (AFM) for step height and pitch measurements in industrial applications is rapidly increasing. To compare the results obtained by different instruments and to achieve high accuracy, the scales of an AFM must be

Results of the NIST National Ball Plate Round Robin

January 1, 1997
Author(s)
Gregory W. Caskey, Steven D. Phillips, Bruce R. Borchardt
This report examines the results of the ball plate round robin administered by NIST. The round robin was part of an effort to assess the current state of industry practices for measurements made using coordinate measuring machines. Measurements of a two

The Calculation of CMM Measurement Uncertainty via The Method of Simulation by Constraints

January 1, 1997
Author(s)
Steven D. Phillips, Bruce R. Borchardt, Daniel S. Sawyer, William T. Estler, David E. Ward, K Eberhardt, M. Levenson, Marjorie A. McClain, B Melvin, Ted Hopp, Y Shen
The calculation of task specific measurement uncertainty when using coordinate measuring machines is an important and challenging task. Current methods to address this issue use simulation techniques (e.g., the virtual CMM) where the propagation of known

The Scanning Electron Microscope

January 1, 1997
Author(s)
Michael T. Postek
The scanning electron microscope (SEM) is an important research and production tool extensively used in many phases of industry throughout the world. The popularity of the instrument results from the need to inspect and obtain information about samples

Tip and Surface Reconstruction in Scanned Probe Microscopy

January 1, 1997
Author(s)
John S. Villarrubia
The non-vanishing size of tips in scanned probe microscopes (e.g., atomic force microscope or scanning tunneling microscope) results in imaging errors. Correction of these errors requires estimation of the tip shape (tip reconstruction) followed by

Is Your Scanning Electron Microscope Hi-Fi?

December 7, 1996
Author(s)
Andras Vladar, Michael T. Postek, S Davilla
The scanning electron microscope (SEM) historically has been used mainly as an image-producing device and, in spite of certain obvious and sometimes serious electronics problems, serves in this function as an acceptable and effective instrument for many

Error Compensation for CMM Touch Trigger Probes

October 1, 1996
Author(s)
William T. Estler, Steven D. Phillips, Bruce R. Borchardt, Ted Hopp, G Witzgall, M Levenson, K Eberhardt, Marjorie A. McClain, Y Shen, X Zhang
We present the analysis of a simple mechanical model of a common type of kinematic seat touch trigger probe widely used on modern coordinate measuring machines (CMMs). The model provides a quantitative description of the pretravel variation or probe-lobing

Stylus-Laser Surface Calibration System

October 1, 1996
Author(s)
Theodore V. Vorburger, Jun-Feng Song, T Giauque, Thomas Brian Renegar, Eric P. Whitenton, M Croarkin
A stylus-laser surface calibration system was developed to calibrate the NIST sinusoidal roughness Standard Reference Materials (SRM) 2071-2075. Step height standards are used to calibrate the stylus instrument in the vertical direction, and a laser

New Certified Length Scale for Microfabrication Metrology

September 1, 1996
Author(s)
James E. Potzick
The National Institute of Standards and Technology is developing a dimensional pitch standard covering the range 1 micrometers to 10 mm, intended for the calibration of microscope magnification and of dimensional metrology instrument scales. Called SRM

Stitching of Equatorial Profiles for Extended Spatial Range Assessment

August 1, 1996
Author(s)
P Sullivan, R E. Parks, Lianzhen Shao
This paper describes a method for stitching multiple overlapping interferometric measurements of the equator of a high quality sphere to produce a single profile representing the roundness of the ball. The resulting optical profile measurement is compared

Modeling Spatial Reasoning Systems With Shape Algebras and Formal Logic

June 1, 1996
Author(s)
Scott Chase
The combination of the paradigms of shape algebras and predicate logic representations,used in a new method for describing designs, is presented. First order predicate logicprovides a natural, intuitive way of representing shapes and spatial relations

Calibration of Scanning Electron Microscope Magnification Standards SRM-484

May 1, 1996
Author(s)
Joseph Fu, Theodore V. Vorburger, D Ballard
Standard Reference Material (SRM) 484 is an artifact for calibrating the magnification scale of a scanning electron microscope. Since 1977 the National Institute of Standards and Technology (NIST) has produced seven issues of SRM484 amounting to

Electrical Test Structures Replicated in Silicon-On-Insulator Material

May 1, 1996
Author(s)
Michael W. Cresswell, J Sniegowski, Rathindra Ghoshtagore, Robert Allen, L Linholm, John S. Villarrubia
Measurements of the linewidths of submicrometer features made by different metrology techniques have frequently been characterized by differences of up to 90 nm. The purpose of the work reported here is to address the special difficulties that this

High Accuracy Overlay Measurements

May 1, 1996
Author(s)
Richard M. Silver, James E. Potzick, Fredric Scire, Robert D. Larrabee
The reduced critical dimensions of semiconductor devices place more stringent requirements on the precision and accuracy of overlay metrology tools used to monitor stepper feature placement. The use of mix and match stepper techniques and step and scan

High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope

May 1, 1996
Author(s)
J R. Lowney, Andras Vladar, Michael T. Postek
Two Monte Carlo computer codes have been written to simulate the transmitted-, backscattered-, and secondary-electron signals from targets in a scanning electron microscope. The first discussed, MONSEL-II, is applied to semi-infinite lines produced
Displaying 1976 - 2000 of 2177
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