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NIST Authors in Bold

Displaying 18951 - 18975 of 73697

Comb-calibrated laser ranging for three-dimensional surface profiling with micrometer-level precision at a distance

October 6, 2014
Author(s)
Esther Baumann, Fabrizio R. Giorgetta, Jean-Daniel Deschenes, William C. Swann, Ian R. Coddington, Nathan R. Newbury
Non-contact surface mapping at a distance is interesting in diverse applications including industrial metrology, manufacturing, forensics, and artifact documentation and preservation. Frequency modulated continuous wave (FMCW) laser detection and ranging

New National Air-Kerma Standard for Low-Energy Electronic Brachytherapy Sources

October 6, 2014
Author(s)
Stephen M. Seltzer, C M. O'Brien, Michael G. Mitch
The purpose of this report is to document the NIST air-kerma measurement standard for the electronic brachytherapy sources, i.e., the Axxent sources of Xoft, Inc., which operate at tube potentials of 50 kV and anode currents of 300 μA. The use of such

Phase-Sensitive Detection of Spin Pumping via the ac Inverse Spin Hall Effect

October 6, 2014
Author(s)
Thomas J. Silva, Justin M. Shaw, Hans T. Nembach, Mathias A. Weiler
Sources of pure spin currents are a fundamental building block of spintronic devices. In ferromagnet/normal metal heterostructures, spin currents are generated at ferromagnetic resonance. This is known as spin pumping, where spin currents of both dc and ac

Progress toward Radiation-Pressure-Based Measurement of High-Power Laser Emission - Under Policy Review

October 6, 2014
Author(s)
Paul A. Williams, Joshua A. Hadler, Daniel King, Robert Lee, Frank C. Maring, Gordon A. Shaw, Nathan A. Tomlin, John H. Lehman, Marla L. Dowell
We present an overview of our efforts toward using optical radiation pressure as a means to measure optical power from high-power lasers. Early results with measurements ranging from tens of watts to 92 kW prove the concept, but validation uncertainties

Estimation of uncertainty in application profiles

October 3, 2014
Author(s)
David W. Flater
Performance is an important facet of software quality, and application profiling tools are the instruments used to measure software performance at the function and application levels. The most powerful measurement method available in application profiling

Towards a Domain-Specific Framework for Predictive Analytics in Manufacturing

October 3, 2014
Author(s)
David J. Lechevalier, Anantha Narayanan Narayanan, Sudarsan Rachuri
Data analytics is proving to be very useful for achieving productivity gains in manufacturing. Predictive analytics (using advanced machine learning) is particularly valuable in manufacturing, as it leads to production improvement with respect to the cost

Origin of Surface Canting Within Fe 3 O 4 Nanoparticles

October 2, 2014
Author(s)
Kathryn L. Krycka, Julie A. Borchers, R. A. Booth, Y. Ijiri, K. Hasz, J. J. Rhyne, S. A. Majetich
The nature of near-surface spin canting within Fe 3O 4 nanoparticles is highly debated. Here we develop a neutron scattering asymmetry analysis which quantifies the spin canting angle to between 23° and 42° at 1.2 T. Simultaneously, an energy-balance model

A Proposed Interim Check for Field Testing a Laser Trackers 3-D Length Measurement Capability Using a Calibrated Scale Bar as a Reference Artifact

October 1, 2014
Author(s)
Vincent D. Lee, Christopher J. Blackburn, Balasubramanian Muralikrishnan, Daniel S. Sawyer, Mark Meuret, Aaron Hudlemeyer
This paper describes a proposed interim check for field testing a laser tracker’s 3-D length measurement capability using a calibrated scale bar as a reference artifact. The tests described here are constructed to be sensitive to uncompensated errors in

A Review of Risk Perception in Building Fire Evacuation

October 1, 2014
Author(s)
Max T. Kinateder, Erica D. Kuligowski, Paul A. Reneke, Richard Peacock
Risk perception (RP) is studied in many research disciplines (e.g., safety engineering, psychology, or sociology), and the contexts surrounding the ways in which different concepts of RP are applied vary greatly. Definitions of RP can be broadly divided

Amplifier and Transistor Noise-Parameter Measurements

October 1, 2014
Author(s)
James P. Randa
Methods for measuring the noise parameters of amplifiers and on-wafer transistors are reviewed. After some preliminary background information and conventions, noise parameters are defined and the most common measurement strategies are presented, both for
Displaying 18951 - 18975 of 73697
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