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Search Publications

NIST Authors in Bold

Displaying 1301 - 1325 of 2189

Physical characterization methods for iron-oxide contrast agents encapsulated within a targeted liposome-based delivery system

April 16, 2008
Author(s)
John A. Dagata, Natalia Farkas, Cindi L. Dennis, Robert D. Shull, Vincent A. Hackley, Charles W. Yang, Kathleen F. Pirollo, Esther H. Chang
Intact liposome-based targeted nanoparticle delivery systems (NDS) are immobilized by nonselective binding and characterized by scanning probe microscopy (SPM) in a fluid imaging environment. The size, size distribution, functionality, and stability of an

A Taxonomy of Homeland Security Modeling, Simulation, and Analysis Applications

April 14, 2008
Author(s)
Charles R. McLean, Sanjay Jain, Yung-Tsun T. Lee
The effective use of modeling, simulation, and analysis (MSA) applications could greatly enhance our ability to carry out the homeland security mission. These applications can be used to evaluate vulnerabilities in the nation s critical infrastructure as

A Layered Approach to Semantic Similarity Analysis of XML Schemas

April 7, 2008
Author(s)
Jaewook Kim, Boonserm Kulvatunyou, Nenad Ivezic, Albert W. Jones
One of the most critical steps to integrating heterogeneous e-Business applications using different XML schemas is schema mapping, which is known to be costly and error-prone. Past schema mapping research has not fully utilized semantic information in the

Long Term Sustainment Workshop Report

March 26, 2008
Author(s)
Joshua Lubell, Mahesh Mani, Eswaran Subrahmanian, Sudarsan Rachuri
This report summarizes the presentations, discussions and recommendations of a workshop held at the National Institute of Standards and Technology (NIST) on April 24-25, 2007. The purpose of the workshop was to identify policies of digital preservation and

Programs of the Manufacturing Engineering Laboratory (2005 - 2008)

March 26, 2008
Author(s)
Lisa J. Fronczek, Bessmarie A. Young
The National Institute of Standards and Technology s Manufacturing Engineering Laboratory (MEL) promotes innovation and the competitiveness of U.S. manufacturing through measurement science, measurement services, and critical technical contributions to

Towards Accurate Feature Shape Metrology

March 22, 2008
Author(s)
Ndubuisi G. Orji, Ronald G. Dixson, B Bunday, J Allgair
Over the last few years, the need for shape metrology for process control has increased. A key component of shape metrology is sidewall angle (SWA). However, few instruments measure SWA directly. The critical dimension atomic force microscope (CD-AFM) is

Engineering Informatics: Introduction to the Special Issue

March 1, 2008
Author(s)
Sudarsan Rachuri, Eswaran Subrahmanian
Computer-aided design, intelligent CAD, engineering analysis, collaborative design support, computer-aided engineering, and product lifecycle management are some of the terms that have emerged over the last 50 years of computing in engineering

The Potentials of Helium Ion Microscopy for Semiconductor Process Metrology

February 6, 2008
Author(s)
Michael T. Postek, Andras Vladar
Semiconductor manufacturing is always looking for more effective ways to monitor and control the manufacturing process. Helium Ion Microscopy (HIM) presents a new approach to process monitoring which has several potential advantages over the traditional

Line Width Measurement Technique Using Through-Focus Optical Images

January 1, 2008
Author(s)
Ravikiran Attota, Richard M. Silver, Ronald G. Dixson
We present a detailed experimental study of a new through-focus technique to measure line width (CD) with nanometer sensitivity using a bright field optical microscope. This method relies on analyzing intensity gradients in optical images at different

Nano- and Atomic-Scale Length Metrology

December 14, 2007
Author(s)
Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, Ndubuisi G. Orji, Shaw C. Feng, Michael W. Cresswell, Richard A. Allen, William F. Guthrie, Wei Chu

Content-Based Assembly Search: A Step Towards Assembly Reuse

November 7, 2007
Author(s)
Ram D. Sriram, A S. Deshmukh, A G. Banerjee, Satyandra K. Gupta
The increased use of CAD systems by product development organizations has resulted in the creation of large databases of assemblies. This explosion of assembly data is likely to continue in the future. In many situations, text-based search alone may not be

The State of Container Security Standards

October 17, 2007
Author(s)
Shaw C. Feng, Simon P. Frechette
As cargo container security is a critical component in the U.S. homeland security, the communication among people in a chain of custody of a container needs to be timely and effective. Since people in the container custody chain often use different

Photomask Applications of Traceable Atomic Force Microscope Dimensional Metrology at NIST

October 1, 2007
Author(s)
Ronald G. Dixson, Ndubuisi G. Orji, James E. Potzick, Joseph Fu, Michael W. Cresswell, Richard A. Allen, S J. Smith, Anthony J. Walton
The National Institute of Standards and Technology (NIST) has a multifaceted program in AFM dimensional metrology. Two major instruments are being used for traceable measurements. The first is a custom in-house metrology AFM, called the calibrated AFM (C

Instrumentation, Metrology, and Standards for Nanomanufacturing

September 10, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over the

Process Monitoring of Turning and Model Adaptation for Smart Machining Systems

September 3, 2007
Author(s)
Jarred C. Heigel, Robert W. Ivester
Smart Machining Systems improve manufacturing efficiency using optimization based on process models. Cutting force models developed from a narrow set of empirical data provide insight into the physical properties of cutting, but the extreme physical
Displaying 1301 - 1325 of 2189
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