July 1, 1997
Author(s)
Richard M. Silver, James E. Potzick, Fredric Scire, Christopher J. Evans, Michael L. McGlauflin, Edward A. Kornegay, Robert D. Larrabee
A new optical alignment artifact under development at NIST is described. This structure, referred to as a stepped microcone, is designed to assist users and manufacturers of overlay metrology tools in the reduction of tool-induced measurement errors. We