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Displaying 53026 - 53050 of 73697

The Molecular Measuring Machine

January 1, 1998
Author(s)
John A. Kramar, E Gilsinn, E Amatucci, C Villarrubia, E C. Teague, W Scire, William B. Penzes
To help meet the measurement needs of industries preparing to manufacture future generations of nanoelectronic devices and circuits, the National Institute of Standards and Technology (NIST) has designed and built an instrument¿called the Molecular

The Proposed Smart Transducer Interface Standard

January 1, 1998
Author(s)
Kang B. Lee
A proposed smart transducer interface standard, P1451 is being developed by TC9, Technical Committee on Sensor Technology, of the Instrumentation and Measurement Society of the Institute of Electrical and Electronic Engineers (IEEE). The proposed standard

The Role of Space Charge in Scanned Probe Oxidation

January 1, 1998
Author(s)
John A. Dagata
The growth rate and electrical character of nanostructures produced by scanned probe oxidation are investigated by integrating an in-situ electrical force characterization technique, scanning Maxwell-stress microscopy, into the fabrication process

The Study of Silicon Stepped Surfaces as Atomic Force Microscope Calibration Standards With a Calibrated AFM at NIST

January 1, 1998
Author(s)
V W. Tsai, Theodore V. Vorburger, Ronald G. Dixson, Joseph Fu, R Koning, Richard M. Silver, E. C. Williams
Due to the limitations of modern manufacturing technology, there is no commercial height artifact at the sub-nanometer scale currently available. The single-atom steps on a cleaned silicon (111) surface with a height of 0.314 nm, derived from the lattice
Displaying 53026 - 53050 of 73697
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