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Search Publications

NIST Authors in Bold

Displaying 38751 - 38775 of 73697

Toward a Framework for Evaluating Ubiquitous Computing Applications

June 1, 2004
Author(s)
Jean C. Scholtz, Sunny Consolvo
Today, much of our information-intensive work is carried out at desktop computer workstations; however, increasingly people work and live on the move. Very soon, scads of small information processing appliances will be carried along from place to place as

Traceability for microwave remote-sensing radiometry

June 1, 2004
Author(s)
James P. Randa
A plan is presented for developing a standard for brightness temperature at microwave frequencies, as well as two different methods for transferring this standard to the microwave remote-sensing community. The standard will be based on existing NIST

Ubiquity of Domain Patterns in Sheared Viscoelastic Fluids

June 1, 2004
Author(s)
Erik K. Hobbie, Sheng Lin-Gibson, Haonan Wang, Jai A. Pathak, H W. Kim
We propose a unified explanation of pattern formation in sheared two-phase viscoelastic fluids that fall within the simple paradigm of interacting soft elastic domains suspended in a less viscous fluid under simple shear flow. Three very different systems

Uncertainty Analysis for Reflectance Colorimetry

June 1, 2004
Author(s)
E A. Early, Maria E. Nadal
The uncertainty associated with the quantitative description of the color of an object is often necessary for determining the acceptability of that object for its intended application. Uncertainties are also required for establishing the traceability of a

Velocity of Transverse Domain Wall Motion Along Thin, Narrow Strips

June 1, 2004
Author(s)
Donald G. Porter, Michael J. Donahue
Micromagnetic simulation of domain wall motion in thin, narrow strips leads to a simplified analytical model. The model accurately predicts the same domain wall velocity as full micromagnetic calculations, including dependence on strip width, thickness

X-Ray and Neutron Porosimetry as Powerful Methodologies for Determining Structural Characteristics of Porous Low-k Thin Films

June 1, 2004
Author(s)
Hae-Jeong Lee, B D. Vogt, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Wen-Li Wu, Eric K. Lin, Gwi-Gwon Kang, Min-Jin Ko
Methylsilsesquioxane based porous low-k dielectric films with varying porogen loading have been characterized using X-ray and neutron porosimetry to determine their pore size distribution, average density, wall density, porosity, density profiles, and

STEP - Compliant NC Research: The Search for Intelligent CAD/CAPP/CAM/CNC Integration

May 31, 2004
Author(s)
Xun W. Xu, H Wang, Jian Mao, S T. Newman, Thomas Kramer, Frederick M. Proctor, John L. Michaloski
Since the first generation of NC machine tool was developed in 1950s, there have been many developments, which make today's NC machines completely unrecognisable from their early ancestors. These developments however are now being significantly limited by

Time Synchronization for Electronic Distributed Systems

May 28, 2004
Author(s)
John D. Gale, Ya-Shian Li-Baboud
Synchronization of clocks in electronic distributed systems has become critical in an increasing number of applications. Accurate knowledge of the correct time facilitates error trapping, productivity, security and safety. By knowing the precise sequence

Evaluation of New In-Chip and Arrayed Line Overlay Target Designs

May 24, 2004
Author(s)
M P. Davidson, M R. Bishop, Robert D. Larrabee, Michael T. Stocker, Jay S. Jun, Egon Marx, Richard M. Silver, Ravikiran Attota
Two types of overlay targets have been designed and evaluated for the study of optical overlay metrology. They are in-chip and arrayed overlay targets. In-chip targets are three-bar two-level targets designed to be placed in or near the active device area

Laser Sample Stage-Based Image Resolution Enhancement Method for SEMs

May 24, 2004
Author(s)
Andras Vladar, Crossley E. Jayewardene, Bradley N. Damazo, William J. Keery, Michael T. Postek
The development of a very fast, very accurate laser stage measurement system facilitates a new method to enhance the image and line scan resolution of scanning electron microscopes (SEMs). This method, allows for fast signal intensity and displacement

Reference Metrology Using a Next Generation CD-AFM

May 24, 2004
Author(s)
Ronald G. Dixson, Angela Guerry
International SEMATECH (ISMT and the National Institute of Standards and Technology (NIST) are working together to improve the traceability of AFM dimensional metrology in semiconductor manufacturing. Due to the unique metrology requirements and the rapid

Superconducting Detectors

May 24, 2004
Author(s)
Kent D. Irwin
Superconducting detectors operated at temperatures near absolute zero are bringing about a broad revolution in measurement capabilities in a wide range of fields. Superconducting detectors are used in measurements across the entire electromagnetic spectrum

Pulse Parameter Dependence on Transition Occurrence Instant and Waveform Epoch

May 20, 2004
Author(s)
Donald R. Larson, Nicholas Paulter, David I. Bergman
The pulse parameters of amplitudeds and transition duration (10% to 90 %) are examined as a function of the epoch and position of the transition edge in the epoch. The primary explanations for the observed variations are the pulse aberrations and the

The Effect of Tilt on Waveform State Levels and Pulse Parameters

May 20, 2004
Author(s)
Nicholas Paulter, Donald R. Larson
Tilt is the slope in waveform values that occurs before and/or after a waveform transition. Tilt causes a bias in the computed values of waveform state levels that may affect the value of several waveform parameters. The effects of tilt on pulse parameters

Authenticating Mobile Device Users Through Image Selection

May 19, 2004
Author(s)
Wayne Jansen
Adequate user authentication is a persistent problem, particularly with mobile devices such as Personal Digital Assistants (PDAs), which tend to be highly personal and at the fringes of an organization's influence. Yet these devices are being used
Displaying 38751 - 38775 of 73697
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