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Displaying 2701 - 2717 of 2717

Frequency Dependencies of Precision Resistors

February 1, 1988
Author(s)
R D. Cutkosky
A variety of ac and dc resistors were examined for frequency dependence from dc to 400 Hz. It is concluded that several choices are available for use as standards in resistance thermometry.

Viscometer for low frequency, low shear rate measurements

August 1, 1986
Author(s)
Robert F. Berg, Michael R. Moldover
We describe a torsion-oscillator viscometer whose low frequency ( 0.5 Hz) and very low shear rate (0.05 s-1) are required for measurements of shear sensitive fluids such as microemulsions, polymer melts and solutions gels, and liquid mixtures near critical

Low Energy Diffuse Scattering Electron Spin Polarization Analyzer

January 1, 1986
Author(s)
John Unguris, Daniel T. Pierce, Robert Celotta
A new, compact (approximately fist sized), efficient electron-spin analyzer is described. It is based on low-energy (150 eV) diffuse scattering from a high-Z target, for example, an evaporated polycrystalline Au film opaque to the incident electron beam

An Intense Source of Monochromatic Electrons: Photoemission from GaAs

January 1, 1984
Author(s)
C Feigerle, Daniel T. Pierce, A Seiler, Robert Celotta
Measurements of intensity and width of the energy distribution for photoemission from negative electron affinity GaAs have been made as a function of surface preparation and temperature. Energy distributions as narrow as 31 meV (full width at half-maximum)

A UHV-Gasket Removal Tool

March 1, 1983
Author(s)
B Waclawski
This note describes a safe, effective tool for removing copper gaskets from ultrahigh vacuum flanges. Use of the tool practically reduces to zero the chance of damaging the flange sealing surface, because all motion of the tool is away from the flange face

Absorbed Current Electron Spin Polarization Detector

October 1, 1981
Author(s)
Daniel T. Pierce, S Girvin, John Unguris, Robert Celotta
The principle of spin analysis by means of measurement of the spin dependent absorption of a polarized electron beam is presented. The spin dependent signal is enhanced relative to the spin averaged signal at an energy near which the secondary yield is

Metrology and process control: dealing with measurement uncertainty

Author(s)
James E. Potzick
Metrology is often used in designing and controlling manufacturing processes. A product sample is processed, some relevant property is measured, and the process adjusted to bring the next processed sample closer to its specification. This feedback loop can
Displaying 2701 - 2717 of 2717
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