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Simple, Compact, High-Purity Cr Evaporator for UHV

Published

Author(s)

Jabez J. McClelland, John Unguris, R E. Scholten, Daniel T. Pierce

Abstract

A simple, compact Cr evaporator is constructed by electroplating Cr metal onto the tip of a W hairpin filament. At 5 cm from the evaporator, deposition rates up to 10 nm min-1 (flux {asymp} 1019 atoms m-2s-1) have been obtained, with total deposition thickness in excess of 400 nm. Auger analyses of thin film deposited in ultrahigh vacuum show impurities below detectability.
Citation
Journal of Vacuum Science and Technology A
Volume
11
Issue
5

Citation

McClelland, J. , Unguris, J. , Scholten, R. and Pierce, D. (1993), Simple, Compact, High-Purity Cr Evaporator for UHV, Journal of Vacuum Science and Technology A (Accessed February 24, 2024)
Created September 1, 1993, Updated February 19, 2017