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NIST Authors in Bold

Displaying 2226 - 2250 of 2915

Microwave Optoelectronic Oscillator with Optical Gain

May 29, 2007
Author(s)
Craig W. Nelson, Archita Hati, David A. Howe, W Zhou
Optoelectronic oscillators (OEO) are unique compared to radio-frequency (RF) oscillators in that they do not fundamentally require a RF gain element in order to satisfy the amplitude threshold condition for oscillation. All the energy required for

Microwave optoelectronic oscillator with optical gain

May 29, 2007
Author(s)
Craig Nelson, Archita Hati, David A. Howe, W Zhou
Optoelectronic oscillators (OEO) are unique compared to radio-frequency (RF) oscillators in that they do not fundamentally require a RF gain element in order to satisfy the amplitude threshold condition for oscillation. All the energy required for

Rheology Measurement of Fresh concrete With a Mixing Truck

November 2, 2005
Author(s)
S Amziane, Chiara C. Ferraris, E Koehler
The main objective of this study is to evaluate the workability of fresh portland cement concrete while it is still in the mixing truck by determining fundamental rheological parameters (plastic viscosity and yield stress). Nine concrete mixtures with

Measurement of Workability of Fresh Concrete Using a Mixing Truck

March 1, 2005
Author(s)
S Amziane, Chiara C. Ferraris, E Koehler
The main objective of this study is to evaluate the workability of fresh portland cement concrete while it is still in the mixing truck by determining fundamental rheological parameters (plastic viscosity and yield stress). Nine concrete mixtures with

Standard Reference Materials--the First Century

January 1, 2003
Author(s)
S D. Rasberry
Over the course of its first one hundred years, the National Institute of Standards and Technology (NIST) has made numerous contributions to advancing the science and practice of measurements. Contributions to fundamental constants and reference data, such

Measured cross sections and ion energies for a CHF 3 discharge.

August 1, 2002
Author(s)
B. Peko, R. Champion, MVVS. Rao, James K. Olthoff
Trifluoromenthane (CHF 3) is used in semiconductor plasma processing chambers to achieve high etch selectivity of an oxide layer over a silicon substrate. Such surface etching is governed by the ion and molecule fluxes near the surface, the concentrations

Special Issue - Crystallography at NIST/NBS

December 1, 2001
Author(s)
Alan D. Mighell, Winnie K. Wong-Ng
The Centennial Celebration of the National Institute of Standards and Technology (NIST), formerly known as the National Bureau of Standards (NBS), takes place in the year 2001. NIST has a long history (> 50 years) of crystallographic research, and has made

Single Molecule Probes

August 1, 2001
Author(s)
Lori S. Goldner, K D. Weston, W F. Heinz, Jeeseong Hwang, E S. DeJong, John P. Marino
The technology to rapidly manipulate and screen individual molecules lies at the frontier of measurement science and impacts emerging bio- and nano-technologies. Fundamental biological and chemical processes can now be probed with unprecedented detail, one

The Application of High-Speed CNC Machining to Prototype Production

June 1, 2001
Author(s)
Tony L. Schmitz, Matthew A. Davies, Brian S. Dutterer, J C. Ziegert
To reduce delays in the design and manufacture of a new part, rapid prototyping is often employed to minimize lead times. In this paper, the application of high-speed machining to the production of monolithic, metallic, functional prototypes is discussed

On-Wafer Measurement of Transmission Lines On Lossy Silicon Substrates

September 25, 2000
Author(s)
Uwe Arz, Dylan Williams, Hartmut Grabinski
This paper examines broadband measurement techniques for electrical properties of planar transmission lines built on lossy silicon substrates. We start by investigating the performance of a new formulation of the calibration com-parison method which is

Surveying Through Solid Walls

June 8, 1997
Author(s)
William C. Stone
A good metrology system in the automated environment must (1) measure the three dimensional position and attitude of any component to a reasonable degree of accuracy; (2) acquire these data fairly rapidly; and (3) be capable of making reliable measurements

NIST Neutron Source Pre-Conceptual Design

February 10, 2025
Author(s)
David Diamond, Abdullah Weiss, Osman Celikten, Jeremy Cook, Dagistan Sahin, Hubert King, Anil Gurgen, Joy Shen
A pre-conceptual design has been completed for a NIST Neutron Source (NNS). It would replace the existing facility at the NIST Center for Neutron Research (NCNR) to enable significantly more thermal and cold neutrons to be used in many more experiments
Displaying 2226 - 2250 of 2915
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