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Search Publications

NIST Authors in Bold

Displaying 2226 - 2250 of 2934

A Bayesian Statistical Model for Hybrid Metrology to Improve Measurement Accuracy

July 31, 2011
Author(s)
Richard M. Silver, Nien F. Zhang, Bryan M. Barnes, Jing Qin, Hui Zhou, Ronald G. Dixson
We present a method to combine measurements from different techniques that reduces uncertainties and can improve measurement throughput. The approach directly integrates the measurement analysis of multiple techniques that can include different

Analysis of photoconductive gain as it applies to single-photon detection

March 30, 2010
Author(s)
Mary A. Rowe, G. M. Salley, E. J. Gansen, Shelley M. Etzel, Sae Woo Nam, Richard P. Mirin
We detail a mathematical framework for photoconductive gain applied to the detection of single photons. Because photoconductive gain is derived from the ability to measure current change for an extended period, its magnitude is reduced as detection speed

Diffusion-controlled reference material for VOC emissions testing: proof of concept

March 3, 2010
Author(s)
Steve Cox, Zhe Liu, John Little, Cynthia H. Reed, Steven J. Nabinger, Andrew K. Persily
Because of concerns about indoor air quality, there is growing awareness of the need to reduce the rate at which indoor materials and products emit volatile organic compounds (VOCs). To meet consumer demand for low emitting products, manufacturers are

A robust algorithm for eye-diagram analysis

November 1, 2008
Author(s)
Jeffrey A. Jargon, Paul D. Hale, Chih-Ming Wang
We present a new method for analyzing eye diagrams that always provides a unique solution by making use of a robust, least-median-of-squares (LMS) location estimator. In contrast to commonly used histogram techniques, the LMS procedure is insensitive to

Interaction Effects in Optically Dense Materials

October 16, 2008
Author(s)
Steven T. Cundiff, J M. Shacklette, Virginia O. Lorenz
The properties of optically dense materials are influenced by interactions between elementary optical excitations. Since such interactions are absent in the dilute limit, the resulting properties are unique to optically dense materials. While linear

Optical Frequency Standards and Their Measurement

October 16, 2008
Author(s)
John L. Hall, Jun Ye
The last four years have seen a revolution in the art and practice of optical frequency measurement. Indeed the gearbox represented by the spectrally-broadened fs laser's comb has sufficiently low noise that we in the optics community have abruptly found

Attenuation of Radio Wave Signals Coupled Into Twelve Large Building Structures

August 1, 2008
Author(s)
Christopher L. Holloway, William F. Young, Galen H. Koepke, Catherine A. Remley, Dennis G. Camell, Yann Becquet
In this report, we investigate radio communication problems faced by emergency responders (firefighters, police and emergency medical personnel) in disaster situations. A fundamental challenge to communications into and out of large buildings is the strong

High-performance carbon nanotube coatings for high-power laser radiometry

January 3, 2008
Author(s)
Krishna Ramadurai, Christopher L. Cromer, Laurence A. Lewis, Katie Hurst, Anne Dillon, Roop Mahajan, John H. Lehman
Radiometry for the next generation of high-efficiency, high-power industrial lasers requires thermal management at optical power levels exceeding 10 kW. Laser damage and thermal transport present fundamental challenges for laser radiometry in support of

Photoconductive lifetimes of carbon nanotubes films

November 29, 2007
Author(s)
Katie Hurst, Richard K. Ahrenkiel, Steve W. Johnston, Anne Dillon, Lara Roberson, John H. Lehman
The photoconductive recombination lifetimes of carbon nanotube (CNT) thin films as a function of wavelength are measured by resonant-coupled photoconductive decay (RCPCD) method (1). The carrier recombination lifetime is a fundamental property of carbon

Conformance Checking of Access Control Policies Specified in XACML

July 24, 2007
Author(s)
Vincent C. Hu, Evan Martin, Tao Xie
Access control is one of the most fundamental and widely used security mechanisms. Access control mechanisms control which principals such as users or processes have access to which resources in a system. To facilitate managing and maintaining access

Microwave Optoelectronic Oscillator with Optical Gain

May 29, 2007
Author(s)
Craig W. Nelson, Archita Hati, David A. Howe, W Zhou
Optoelectronic oscillators (OEO) are unique compared to radio-frequency (RF) oscillators in that they do not fundamentally require a RF gain element in order to satisfy the amplitude threshold condition for oscillation. All the energy required for

Microwave optoelectronic oscillator with optical gain

May 29, 2007
Author(s)
Craig Nelson, Archita Hati, David A. Howe, W Zhou
Optoelectronic oscillators (OEO) are unique compared to radio-frequency (RF) oscillators in that they do not fundamentally require a RF gain element in order to satisfy the amplitude threshold condition for oscillation. All the energy required for

Rheology Measurement of Fresh concrete With a Mixing Truck

November 2, 2005
Author(s)
S Amziane, Chiara C. Ferraris, E Koehler
The main objective of this study is to evaluate the workability of fresh portland cement concrete while it is still in the mixing truck by determining fundamental rheological parameters (plastic viscosity and yield stress). Nine concrete mixtures with

Measurement of Workability of Fresh Concrete Using a Mixing Truck

March 1, 2005
Author(s)
S Amziane, Chiara C. Ferraris, E Koehler
The main objective of this study is to evaluate the workability of fresh portland cement concrete while it is still in the mixing truck by determining fundamental rheological parameters (plastic viscosity and yield stress). Nine concrete mixtures with

Standard Reference Materials--the First Century

January 1, 2003
Author(s)
S D. Rasberry
Over the course of its first one hundred years, the National Institute of Standards and Technology (NIST) has made numerous contributions to advancing the science and practice of measurements. Contributions to fundamental constants and reference data, such

Measured cross sections and ion energies for a CHF 3 discharge.

August 1, 2002
Author(s)
B. Peko, R. Champion, MVVS. Rao, James K. Olthoff
Trifluoromenthane (CHF 3) is used in semiconductor plasma processing chambers to achieve high etch selectivity of an oxide layer over a silicon substrate. Such surface etching is governed by the ion and molecule fluxes near the surface, the concentrations
Displaying 2226 - 2250 of 2934
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