Evans, C.
, Parks, R.
, Shao, L.
and Davies, A.
(2000),
Interferometric Metrology of Photomask Blanks: Approaches Using 633 nm Wavelength Illumination, NIST Interagency/Internal Report (NISTIR), National Institute of Standards and Technology, Gaithersburg, MD
(Accessed October 10, 2025)
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Interferometric Metrology of Photomask Blanks: Approaches Using 633 nm Wavelength Illumination
Published
Author(s)
, , L Z. Shao,
Abstract
Preliminary analyses of three optical configurations for measurement of photomask blanks are described. A simple variant of the well known Ritchey-Common test should allow front surface, as-chucked flatness to be measured using current, commercially available phase measuring interferometers. Taking advantage of particular features of a special purpose interferometer installed at NIST, additional information may be obtained.Citation
NIST Interagency/Internal Report (NISTIR) - 6701
Report Number
6701
NIST Pub Series
Pub Type
NIST Pubs
Keywords
interferometry, lithographs, photomasks, scatter
Citation
Issues
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Created December 1, 2000, Updated February 19, 2017