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Interferometric Metrology of Photomask Blanks: Approaches Using 633 nm Wavelength Illumination

Published

Author(s)

Christopher J. Evans, R E. Parks, L Z. Shao, Angela Davies

Abstract

Preliminary analyses of three optical configurations for measurement of photomask blanks are described. A simple variant of the well known Ritchey-Common test should allow front surface, as-chucked flatness to be measured using current, commercially available phase measuring interferometers. Taking advantage of particular features of a special purpose interferometer installed at NIST, additional information may be obtained.
Citation
NIST Interagency/Internal Report (NISTIR) - 6701
Report Number
6701

Keywords

interferometry, lithographs, photomasks, scatter

Citation

Evans, C. , Parks, R. , Shao, L. and Davies, A. (2000), Interferometric Metrology of Photomask Blanks: Approaches Using 633 nm Wavelength Illumination, NIST Interagency/Internal Report (NISTIR), National Institute of Standards and Technology, Gaithersburg, MD (Accessed May 31, 2023)
Created December 1, 2000, Updated February 19, 2017