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PUBLICATIONS

Interferometric Metrology of Photomask Blanks: Approaches Using 633 nm Wavelength Illumination

Published

Author(s)

Christopher J. Evans, R E. Parks, L Z. Shao, Angela Davies

Abstract

Preliminary analyses of three optical configurations for measurement of photomask blanks are described. A simple variant of the well known Ritchey-Common test should allow front surface, as-chucked flatness to be measured using current, commercially available phase measuring interferometers. Taking advantage of particular features of a special purpose interferometer installed at NIST, additional information may be obtained.
Citation
NIST Interagency/Internal Report (NISTIR) - 6701
Report Number
6701
NIST Pub Series
NIST Interagency/Internal Report (NISTIR)
Pub Type
NIST Pubs

Keywords

interferometry, lithographs, photomasks, scatter
Dimensional metrology

Citation

Evans, C. , Parks, R. , Shao, L. and Davies, A. (2000), Interferometric Metrology of Photomask Blanks: Approaches Using 633 nm Wavelength Illumination, NIST Interagency/Internal Report (NISTIR), National Institute of Standards and Technology, Gaithersburg, MD (Accessed December 11, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 1, 2000, Updated February 19, 2017