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Using an ultrasonic pulse-echo method, we measured the elastic coefficients of polycrystalline indium from 300 to 5K. All elastic coefficients showed regular
R Farrow, Michael T. Postek, William J. Keery, Samuel N. Jones, J R. Lowney, M Blakey, L Fetter, J Griffith, J E. Liddle, L C. Hopkins, H A. Huggins, M Peabody, A Novembre
Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the
The calculation of uncertainty for a measurement is an effort to set reasonable bounds for the measurement result according to standardized rules. Since every
J E. Liddle, M Blakey, T Saunders, R Farrow, L Fetter, C Kneurek, R Kasica, et al, M Peabody, Shannon L. Takach, D L. Windt, Michael T. Postek
Mask metrology is a vital part of any lithographic technology, both for control of the mask patterning process and also for ensuring that the contribution of
Pulsed discharge sources of supersonically cooled F radicals have been crossed with supersonically cooled H 2 to study the F( 2P3/2, 2P1/2)+H 2->HF(Ņ,J)+H
R Farrow, Michael T. Postek, William J. Keery, Samuel N. Jones, J R. Lowney, M Blakey, L Fetter, A Liddle, L C. Hopkins, H A. Huggins, M Peabody, A Novembre, J Griffith
Linewidth measurements were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam lithography mask using the
Alline F. Myers, Eric B. Steel, M Q. Ding, S M. Camphausen, W B. Choi, J J. Cuomo, J J. Hren
The microstructure of highly sp 2 bonded amorphous carbon (a-C) and partially tetrahedrally bonded amorphous carbon (ta-C) films deposited on needle-shaped Mo
Stephen E. Russek, C. T. Rogers, L S. Kirschenbaum, P D. Beale, Steven C. Sanders
We report a correlation between peaks observed in the resistance versus applied magnetic field and low frequency resistance noise for Ni81Fe19/Ag giant
A summary is given of the current work of Technical Committee (TC) 201 on Surface Chemical Analysis (SCA) of the International Organization for Standardization