Germer, T.
(1998),
Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers, ed. by J. C. Stover, SPIE
(Accessed May 8, 2025)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Application of bidirectional ellipsometry to the characterization of roughness and defects in dielectric layers, ed. by J. C. Stover
Published
Author(s)
Citation
SPIE
Volume
3275
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 1998, Updated February 17, 2017