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Journals

Recent developments in large-scale dimensional metrology

Author(s)
G Peggs, P.G Maropoulos, E.B Hughes, Alistair Forbes, S Robson, M Ziebart, Bala Muralikrishnan
With ever-more demanding requirements for the accurate manufacture of large components, dimensional measuring techniques are becoming progressively more

Demonstrating the Comparability of Certified Reference Materials

Author(s)
David L. Duewer, Katrice A. Lippa, Stephen E. Long, Karen E. Murphy, Katherine E. Sharpless, Lorna T. Sniegoski, Michael J. Welch
Certified Reference Materials (CRMs) enable the meaningful comparison of measurement results over time and place. When CRMs are used to calibrate or verify the

Two-Body Models for Analyzing Complex Impedance

Author(s)
Douglas A. Bennett, Robert D. Horansky, Joel N. Ullom
Complex impedance is an important and widely used technique for characterizing microbolometers and microcalorimeters. Often, complex impedance data from actual

Optimize Noise Filtration through Dynamical Decoupling

Author(s)
Hermann Uys, Michael J. Biercuk, John J. Bollinger
One approach to maintaining phase coherence of qubits through dynamical decoupling consists of applying a sequence of Hahn spin-echo pulses. Recent studies have

A Guide to the RIA Workshop Data Archive

Author(s)
Ian M. Soboroff
During the course of the Reliable Information Access (RIA) workshop, a data archive was created to hold the outputs of the many experiments being done. This

The Virtual Cybernetic Building Testbed-A Building Emulator

Author(s)
Steven T. Bushby, Michael A. Galler, Natascha S. Milesi-Ferretti, Cheol D. Park
Building emulators couple computer simulations to real control hardware, creating a useful tool for studying building control system performance. The National

Approaches to color rendering measurement

Author(s)
Wendy L. Davis, Yoshihiro Ohno
Color rendering refers to a light source’s ability to make the colors of illuminated objects appear natural or accurate. The Color Rendering Index (CRI) is

At-Wavelength Metrology for EUV Lithography at NIST

Author(s)
Charles S. Tarrio, Steven E. Grantham, Robert E. Vest, Thomas B. Lucatorto
The National Institute of Standards and Technology (NIST) is active in many areas of metrology impacting extreme ultraviolet lithography. We will describe our
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