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PUBLICATIONS

Nanoscale Measurements with a Through-Focus Scanning-Optical-Microscope

Published

Author(s)

Ravikiran Attota, Richard M. Silver, Thomas A. Germer

Abstract

We present a novel optical technique that produces nanometer dimensional measurement sensitivity using a conventional optical microscope, by analyzing through-focus scanning-optical-microscope (TSOM) images obtained at different focus positions. In principle, this technique can be used to identify which dimension is changing between two nanosized targets and to determine the dimension using a library-matching method. This methodology has potential utility for a wide range of target geometries and application areas, including, nanometrology, nanomanufacturing, defect analysis, semiconductor process control, and biotechnology.
Citation
Future Fab International
Pub Type
Journals

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Keywords

Through Focus, Scanning, Optical Microscope, Nanometrology, TSOM, Nanomanufacturing
Advanced communications, Electronics, Semiconductors, Metrology, Dimensional metrology, Nanotechnology, Nanobiotechnology and Nanometrology

Citation

Attota, R. , Silver, R. and Germer, T. (2009), Nanoscale Measurements with a Through-Focus Scanning-Optical-Microscope, Future Fab International, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=902707 (Accessed April 26, 2024)

Created July 15, 2009, Updated February 19, 2017