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Journals

Device Modeling Bias in ReRAM-Based Neural Network Simulations

Author(s)
Imtiaz Hossen, Matthew Daniels, Martin Lueker-Boden, Andrew Dienstfrey, Gina Adam, Osama Yousuf
The study of resistive-RAM (ReRAM) devices for energy efficient machine learning accelerators requires fast and robust simulation frameworks that incorporate

Methods for the SI Value Assignment of the Purity of Organic Compounds (IUPAC Technical Report)

Author(s)
David L. Duewer, Katrice Lippa, Brian Lang, Blaza Toman, Michael Nelson, Kenneth W. Pratt, Steven Westwood, Yoshitaka Yoshitaka Shimuzu, Takeshi Saito, Beatrice Lalerle, Xinhua Dai, Stephen Davies, Marina Ricci, Annarita Baldan, Stefan Sarge, Haifeng Wang, Ralf D. Josephs, Michal Mariassy, Dietmar Pfieffer, John Warren, Wolfram Bremser, Stephen L.R. Ellison, Ting Huang, Ales Fajgelj, Lindsey Mackay, Robert Wielgosz
Metrological traceability to the SI of the result of an analysis for an organic compound is achieved through a calibration hierarchy anchored in a primary

3D Asymmetric Bilayer Garnet-Hybridized High-Energy-Density Lithium-Sulfur Batteries

Author(s)
Changmin Shi, Tanner Hamann, Saya Takeuchi, George Alexander, Adelaide M. Nolan, Matthew Limpert, Zhezhen Fu, Jonathan O'Neill, Griffin Godbey, Joseph A. Dura, Eric Wachsman
Lithium garnet Li 7La 3Zr 2O 12 (LLZO) with high ionic conductivity and chemical stability against a Li metal anode is considered one of the most promising

On-Wafer Vector-Network-Analyzer Measurements at mK Temperatures

Author(s)
Elyse McEntee Wei, Richard Chamberlin, Nate Kilmer, Joshua Kast, Jake A. Connors, Dylan Williams
We describe a system for performing on-wafer vector-network-analyzer measurements from 100 MHz to 15 GHz at mK temperatures (i.e., less than 20 mK). We first

Reference materials for phase equilibrium studies. 2. Solid–liquid equilibria (IUPAC Technical Report)

Author(s)
Ala Bazyleva, William E. Acree, Vladimir Diky, Glenn T. Hefter, Johan Jacquemin, M. Clara F. Magalhães, Joe W. Magee, Kirk Nordstrom, John O'Connell, James D. Olson, Ilya Polishuk, Kurt A. G. Schmidt, John M. Shaw, J. P. Martin Trusler, Ronald D. Weir
This article is the second of three projected IUPAC Technical Reports on reference materials for phase equilibrium studies. The goal of this project was to

Defining Chi for Block Copolymer Lithography

Author(s)
Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey
Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength