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Conferences

Computerized Representations of Manufacturing Resources: Statement of Need and a Proposed Solution

June 1, 1996

Author(s)

James E. Fowler, Mary B. Algeo, Kevin K. Jurrens

The Systems Integration For Manufacturing Applications (SIMA) Program is NIST's coordinating focus for manufacturing activities supporting the High Performance

NIST Comparison of the Quantized Hall Resistance and the Realization of the SI Ohm Through the Calculable Capacitor

June 1, 1996

Author(s)

Anne-Marie Jeffery, Randolph Elmquist, Lai H. Lee, John Q. Shields, Ronald F. Dziuba

RF-DC Differences of Micropotentiometers

June 1, 1996

Author(s)

D. X. Huang, G. Rebuldela, J. Harper

A 7-Junction Electron Pump: Design and Operation

June 1, 1996

Author(s)

Mark W. Keller, John M. Martinis, Neil M. Zimmerman

Measurement and Reduction of Alignment Errors of the NIST Watt Experiment

June 1, 1996

Author(s)

Andrew Gillespie, K Fujii, David B. Newell, P. T. Olsen, Alain Picard, Richard L. Steiner, Gerard N. Stenbakken, Edwin R. Williams

Transient Errors in a Precision Resistive Divider

June 1, 1996

Author(s)

S. A. Boggs, Gerald FitzPatrick, J. Kuang

High-Current Thin Film Multijunction Thermal Converters and Multi-Converter Modules

June 1, 1996

Author(s)

Joseph R. Kinard Jr., Thomas E. Lipe Jr., Clifton B. Childers, Donald B. Novotny, D. X. Huang

Uncertainties of Frequency Response Estimates Derived from Responses to Uncertain Step-Like Inputs

June 1, 1996

Author(s)

J. P. Deyst, T. M. Souders, Jerome J. Blair

Validation of Standards Interfaces for Machine Control

May 27, 1996

Author(s)

Frederick M. Proctor, John L. Michaloski, William P. Shackleford, Sandor S. Szabo

Open architecture controllers offer a multitude of benefits to users of machine tools, robots, and coordinate measuring machines, ultimately reducing the life

Polymer Combustion and New Flame Retardants

May 20, 1996

Author(s)

Takashi Kashiwagi, Anthony P. Hamins, Kenneth D. Steckler, Jeffrey W. Gilman

The combustion of polymers is a complex coupled process characterized by energy feedback from a flame to the polymer surface and subsequent gasification of the

Analysis of High Bay Hangar Facilities for Detector Sensitivity and Placement

May 20, 1996

Author(s)

Kathy A. Notarianni, J E. Gott

Existing building and fire codes in the United States offer little or no guidance in the design of fire protection systems in high bay spaces due to the lack of

New Silyl Derivatives for the Determination of Alcohols by GC/MS

May 12, 1996

Author(s)

Vladimir G. Zaikin, Michael Y. Shmatko, Anzor I. Mikaia

1-Methyl-1-silacyclobutyl, 1-Methyl-1-silacyclopentyl, pentamethyldisilaethyl and pentamethyl-1,3- disilapropyl derivatives for alcohols are obtained, and

Ab Initio Calculations and Kinetic Modeling of Halon and Halon Replacements

May 7, 1996

Author(s)

H. L. Paige, R J. Berry, M Schwartz, P Marshall, D R. Burgess, Marc R. Nyden

The mode of action of the chemical-acting flame suppression agents such as the halons is generally, though not universally, accepted. The details of the several

Quantum Hall Effect-Based Resistance Standard

May 1, 1996

Author(s)

Kevin C. Lee

Characterization of ultrafast interactions with materials through the direct measurement of the optical phase

May 1, 1996

Author(s)

Tracy S. Clement, G Rodriguez, W M. Wood, A J. Taylor

The change in phase of ultrashot optical pulses induced by traveling through nonlinear media is used to determine the nonlinear index of refraction and to study

Controlling Activities in a Virtual Manufacturing Cell

May 1, 1996

Author(s)

Michael Iuliano, Albert W. Jones

Researchers at the National Institute of Standards and Technology are developing a virtual manufacturing cell. This cell will contain simulation models of a

Dynamic Objects and Meta-level Programming of an EXPRESS Language Environment

May 1, 1996

Author(s)

Peter O. Denno

This paper describes design and programming techniques employed in the development of a language environment for the EXPRESS information modeling language. A

International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL)

May 1, 1996

Author(s)

James E. Potzick, J Nunn

Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards

New Algorithm for the Measurement of Pitch in Metrology Instruments

May 1, 1996

Author(s)

Nien F. Zhang, Michael T. Postek, Robert D. Larrabee, L Carroll, William J. Keery

Traditionally, the measurement of pitch in metrology instruments is thought to be a benign self-compensating function. However, as the measurement uncertainty

Calibration of Scanning Electron Microscope Magnification Standards SRM-484

May 1, 1996

Author(s)

Joseph Fu, Theodore V. Vorburger, D Ballard

Standard Reference Material (SRM) 484 is an artifact for calibrating the magnification scale of a scanning electron microscope. Since 1977 the National

High-Accuracy Critical-Dimension Metrology Using a Scanning Electron Microscope

May 1, 1996

Author(s)

J R. Lowney, Andras Vladar, Michael T. Postek

Two Monte Carlo computer codes have been written to simulate the transmitted-, backscattered-, and secondary-electron signals from targets in a scanning

Electrical Test Structures Replicated in Silicon-On-Insulator Material

May 1, 1996

Author(s)

Michael W. Cresswell, J Sniegowski, Rathindra Ghoshtagore, Robert Allen, L Linholm, John S. Villarrubia

Measurements of the linewidths of submicrometer features made by different metrology techniques have frequently been characterized by differences of up to 90 nm

High Accuracy Overlay Measurements

May 1, 1996

Author(s)

Richard M. Silver, James E. Potzick, Fredric Scire, Robert D. Larrabee

The reduced critical dimensions of semiconductor devices place more stringent requirements on the precision and accuracy of overlay metrology tools used to

Toward Accurate Linewidth Metrology Using Atomic Force Microscopy and Tip Characterization

May 1, 1996

Author(s)

Ronald G. Dixson, J Schneir, T Mcwaid, N. Sullivan, V W. Tsai, S Zaidi, S Brueck

As the critical dimensions of integrated circuit features decrease toward 0.18 um, feature width measurements with nanometer level accuracy will become

Fundamentals and Problems of Fiber Current Sensors

May 1, 1996

Author(s)

Gordon W. Day, Kent B. Rochford, Allen Rose

Magneto-Optic Rotation Sensor Using a Laser Diode as Both Source and Detector

May 1, 1996

Author(s)

Kent B. Rochford, Allen Rose

SEMCconductors Resistivity Measurements Using Split-Dielectric Resonator Technique

May 1, 1996

Author(s)

Jerzy Krupka, S. Pietruszko, Richard G. Geyer, James R. Baker-Jarvis, Kristof Derzakowski

Interference-Filter Characterization of Spectraradiometers and Colorimeters

May 1, 1996

Author(s)

Paul A. Boynton, Yoshi Ohno, Edward F. Kelley

Specular and Diffuse Reflection Measurements of Electronic Displays

May 1, 1996

Author(s)

George R. Jones Jr., Edward F. Kelley, Thomas Germer

Measurement of a CD and Sidewall Angle Artifact with Two Dimensional CD AFM Metrology

May 1, 1996

Author(s)

Ronald G. Dixson, N. Sullivan, J Schneir, T Mcwaid, V W. Tsai, J Prochazka, M. Young

Despite the widespread acceptance of SEM metrology in semiconductor manufacturing, there is no SEM CD standard currently available. Producing such a standard is

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