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International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL)

Published

Author(s)

James E. Potzick, J Nunn

Abstract

Photomask linewidth standards serve as primary standards for the calibration of photomask metrology tools and are available from the national standards organizations of several countries. These standards are often in the form of chrome-on-quartz photomasks with a variety of linewidth, spacewidth, and pitch patterns. The British and U.S. national laboratories have made comparative measurements of linewidth, spacewidth, and pitch on two national photomask linewidth standards in order to detect any systematic differences between their respective calibration systems. The measurement differences were all found to be within the calibration expanded uncertainties of both laboratories combined, and are not significant at the 95% confidence level.
Proceedings Title
Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor
Volume
2725
Conference Dates
March 11, 1996
Conference Location
Santa Clara, CA, USA
Conference Title
Standards and Calibration Methods for Critical Dimension Metrology

Keywords

accuracy, calibration, critical dimension, international standard, linewidth, measurement standard, photomask, pitch

Citation

Potzick, J. and Nunn, J. (1996), International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL), Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA (Accessed June 22, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created April 30, 1996, Updated October 12, 2021