TY  - CONF
AU  - James Potzick
AU  - J Nunn
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA
DA  - 1996-05-01 00:05:00
LA  - en
M1  - 2725
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA
PY  - 1996
TI  - International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL)
ER  -