@conference{774886,
  author = {James Potzick and J Nunn},
  title = {International Comparison of Photomask Linewidth Standards: U.S. (NIST) and U.K. (NPL)},
  year = {1996},
  number = {2725},
  month = {1996-05-01 00:05:00},
  publisher = {Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography X, Susan K. Jones, Editor, Santa Clara, CA, USA},
  language = {en},
}