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Steven Grantham (Fed)

Steve Grantham received his Ph.D. from the University of Central Florida's Center for Research and Education in Optics and Lasers (CREOL). His graduate research involved the study and application of short pulse laser produced plasmas. He is currently in a lead role of the Physical Measurement Laboratory’s team for development of the Additive Manufacturing Metrology Testbed (AMMT) and the Temperature and Emittance of Melts, Powders and Solids (TEMPS) system.

Research InterestS

  • Laser-matter interactions

  • Additive manufacturing

  • Emittance and temperature measurement

  • EUV reflectometry

  • EUV radiometry

Awards

  • NIST Colleagues’ Choice Award 2015
  • Department of Commerce Silver Medal, 2013
  • William P. Slichter Award, 2007
  • Department of Commerce Silver Medal, 2004

Selected Publications

A Novel Wafer-plane Dosimeter for EUV Lithography

Author(s)
Steven E. Grantham, Charles S. Tarrio
Extreme Ultraviolet Lithography (EUVL) incorporates 13.5 nm light for patterning wafers and requires in-situ wafer-plane dosimetry that can be tailored to the

EUVL dosimetry at NIST

Author(s)
Charles S. Tarrio, Steven E. Grantham, Marc J. Cangemi, Robert E. Vest, Thomas B. Lucatorto, Noreen Harned
As part of its role in providing radiometric standards in support of industry, NIST has been active in advancing extreme ultraviolet dosimetry on various fronts

Publications

NIST efforts in extreme-ultraviolet metrology

Author(s)
Charles S. Tarrio, Steven Grantham, Rob Vest, Thomas A. Germer, Bryan Barnes, Stephanie Moffitt, Brian Simonds, Matthew Spidell
For several decades, the National Institute of Standards and Technology (NIST) has actively supported metrology programs for extreme ultraviolet (EUV)
Created October 9, 2019, Updated December 8, 2022