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Kin (Charles) Cheung

Dr. Cheung is a physical scientist in the Nanoscale Imaging Group in the Nanoscale Device Characterization Division of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST). Prior to joining NIST in 2007, Dr. Cheung was an associate professor in Rutgers University. Prior to Rutgers University, Dr. Cheung spent 18 Years as a member of the technical staff at Bell Laboratories in Murray Hill, NJ. Dr. Cheung published over 140 refereed journal and conference papers. He has written a monograph entitled "Plasma Charging Damage" which published in 2000. He holds 6 patents. Dr. Cheung taught tutorials in many international conferences. He also served in the committees of many of these conferences. Dr. Cheung received the Bell Lab President's Gold Award in 1997, and the Outstanding Achievement Award from the International Symposium on Plasma Process-Induced Damage.

Publications

Created August 15, 2019, Updated October 9, 2019