Modern nanomaterials are often composed of many different elements, materials, and phases. Traditional atom probe tomography (APT) uses a single laser wavelength to trigger the field-assisted evaporation of ions from a specimen. However, the “ideal” wavelength for a metal might be completely ineffective for an insulator or a semiconductor. Using only one wavelength often results in poor data quality or the inability to analyze multiphase materials effectively during a single data collection run.
This invention is a high-precision atomic-scale analysis system designed to map the atomic-scale chemical structure of materials with improved accuracy and precision. By integrating a multi-wavelength pulsed radiation source with a high-voltage power supply, the system identifies and locates individual atoms in 3D. Its primary value proposition is a dynamic feedback control system: as the detector receives ion signals, the system instantly and automatically adjusts laser timing, pulse intensity, and voltage levels in real-time. This self-optimizing capability eliminates the need for manual laser tuning, ensuring the system consistently delivers high-quality data at a faster rate, making it an essential tool for industrial R&D in semiconductors and energy storage.