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Gaithersburg

Human Factors Task Group

The FSSB’s Human Factors Task Group is primarily comprised of at least one member from each Scientific Area Committee (SAC) and members from...

Resource Task Groups

Task groups bring together subject matter experts to review or draft standards or accomplish a specific OSAC task or priority. OSAC has...

NIST Announces Competition for Community Resilience Center of Excellence

July 9, 2014

The National Institute of Standards and Technology (NIST) has announced a competition to create a Community Resilience Center of Excellence dedicated to...

NIST Hosts "Innovations in STEM: National Priorities and NIST" Symposium with HBCUs and HSIs

Mon, Nov 3 - Tue, Nov 4 2014

This two-day Invitational Forum is designed to acquaint Administrators, Faculty and Students from Historically Black

A phantom (life-size dummy) in the scanner

Backscatter Body Scan Redux

July 21, 2014

Airline passengers have already said bon voyage to the controversial backscatter x-ray security scanners, pulled from U.S. airports in 2013 over concerns about...

Light Sheet Fluorescence Microscopy (LSFM): Imaging Faster and Gentler

Tue, May 20 2014

Light Sheet Fluorescence Microscopy (LSFM) has emerged as a powerful fluorescence microscopy tool for cell and

Hybrid Interactions in Plasmonic and Molecular Systems Resulting in Fano Resonances and Surface Enhanced Infrared Absorption (SEIRA)

Thu, Jul 3 2014

One of the fundamental properties of nanophotonics research is the electromagnetic interaction of different systems at

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The Vivid Realism of 3D Functions, Right There on Your Browser

July 1, 2014

A classic online mathematical reference offered by the National Institute of Standards and Technology (NIST) now features a better way for users to view its...

NIST researchers are gathering skin reflectance data to establish the variation found in human tissue in order to develop reference standards for hyperspectral imaging applications.

Seeing Your True Colors: Standards for Hyperspectral Imaging

July 1, 2014

Today, doctors who really want to see if a wound is healing have to do a biopsy or some other invasive technique that, besides injuring an already injured...

New NIST Metamaterial Gives Light a One-Way Ticket

July 1, 2014

The light-warping structures known as metamaterials have a new trick in their ever-expanding repertoire. Researchers at the National Institute of Standards and...

NIST Exhibits at the 2014 NCSL International Workshop and Symposium

Sun, Jul 27 - Wed, Jul 30 2014

NCSLI 2014: Measurement Science and the Environment The increasing demands for measurements to quantify the state of the

Supreme Court Cites NIST Mobile Forensics Guide in Ruling on Cell Phone Searches

July 1, 2014

As digital technology transforms 21st century life, questions about privacy rights abound. The U.S. Supreme Court ruled on one such question in late June: if...

NIST Test House Exceeds Goal; Ends Year with Energy to Spare

July 1, 2014

The net-zero energy test house at the National Institute of Standards and Technology (NIST) in suburban Washington, D.C., not only absorbed winter's best shot...

New York Area Disaster Resilience Workshop Set for July 30, 2014

July 1, 2014

The second in a series of regional workshops devoted to developing a community-centric "disaster resilience framework" to minimize the impacts of hazards and...

Call for Comments: A Strategic Plan for the Materials Genome Initiative

June 27, 2014

The federal government is looking for public comment on a draft strategic plan for the Obama administration's Materials Genome Initiative (MGI). The draft 2014...

NIST to Award up to $2.5 Million for Business-to-Business Matching Systems

June 27, 2014

Through 25 years of working with small and mid-size U.S. manufacturers, the National Institute of Standards and Technology (NIST) Hollings Manufacturing...

NIST engineer pointing at a firing pin impression.

NIST Names Members to First Forensic Science Standards Board

June 26, 2014

As part of its efforts to improve the scientific basis of forensic evidence used in courts of law, the U.S. Commerce Department's National Institute of...

Legal Task Group

The FSSB’s Legal Task Group is primarily comprised of at least one member from each Scientific Area Committee (SAC) and members from OSAC...

New Math Technique Improves Atomic Property Predictions to Historic Accuracy

June 25, 2014

[This article was revised on July 23, 2014, to clarify the relationship between the work reported here and the related problem of calculating relativistic and...

NIST Seeks Members for Three New Cloud Computing Working Groups

June 23, 2014

The National Institute of Standards and Technology (NIST) Cloud Computing Program (NCCP) is forming three public working groups to provide solutions to cloud...

Photograph of the Xactix Xetch xenon difluoride silicon etcher.

NanoFab Tool: Xactix Xetch Xenon Difluoride Silicon Etcher

The Xactix Xetch is a single wafer tool which isotropically etches silicon using vapor phase xenon difluoride. The xenon difluoride etch process provides high

Photograph of the SPTS Etch hydrofluoric acid vapor etcher

NanoFab Tool: SPTS microEtch Hydrofluoric Acid Vapor Etcher

The SPTS µEtch is a single wafer hydrofluoric acid vapor etcher used to release silicon microstructures in microelectromechanical systems (MEMS) devices. It

Photograph of the Unaxis 790 reactive ion etcher.

NanoFab Tool: Reactive Ion Etcher Unaxis 790 Right

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

NanoFab Tool: Reactive Ion Etcher Unaxis 790 Middle

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

Photograph of the 4Wave IBE-20B ion milling system.

NanoFab Tool: 4Wave IBE-20B Ion Milling System

The 4Wave IBE-20B ion milling system uses a broad argon ion beam to controllably and uniformly remove material from a user's substrate. A secondary ion mass

Photograph of the Tousimis Autosamdri-815 Series B critical point dryer.

NanoFab Tool: Tousimis Autosamdri-815 Series B

The Tousimis Supercritical Autosamdri-815 Series B critical point dryer utilizes liquid carbon dioxide (LCO 2) to dry substrates in a controlled manner in order

Photograph of the Semitool PSC-101 double stack spin rinse dryer.

NanoFab Tool: Semitool PSC-101 Spin Rinse Dryer

The Semitool PSC-101 spin rinse dryer uses deionized water to rinse and heated nitrogen to dry whole wafer substrates automatically after wet chemical processes

Photograph of the Reynolds RCA wet bench.

NanoFab Tool: Reynolds RCA Wet Bench

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to processing in high temperature furnaces

Photograph of the Reynolds Tech silicon nitride etch wet bench.

NanoFab Tool: Reynolds Tech Silicon Nitride Etch Wet Bench

The Reynolds Tech silicon nitride etch wet bench uses dilute phosphoric acid to preferentially etch silicon nitride on silicon. The process is used to define

Photograph of the Reynolds Tech silicon etch wet bench.

NanoFab Tool: Reynolds Tech Silicon Etch Wet Bench

The Reynolds Tech silicon etch wet bench uses dilute potassium hydroxide (KOH) to preferentially etch silicon along the material's crystal planes. The process

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