March 27, 2013
Author(s)
Leonid A. Bendersky, N. V. Kazantseva, Ursula R. Kattner, M K. Kang, Vladimir P. Oleshko, Dwight Hunter, Ichiro Takeuchi
The interdiffusion reaction between Co(1-x)Fex deposited films of various compositions (x = 0.27, 0.32 and 0.50) and an amorphous SiO2 substrate during annealing in vacuum at 800o C was identified by analytical transmission electron microscopy. The