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Displaying 1 - 25 of 231

Instrument Development for Spectroscopic Ellipsometry and Diffractometry in the EUV

April 24, 2024
Author(s)
Stephanie Moffitt, Bryan Barnes, Thomas A. Germer, Steven Grantham, Eric Shirley, Martin Sohn, Daniel Sunday, Charles S. Tarrio
Semiconductor devices are noted for ever-decreasing dimensions but now are also becoming more complex. While scanning probe microscopy can still resolve the smallest features, it does not have the throughput for high-volume characterization of full wafers

NIST efforts in extreme-ultraviolet metrology

November 21, 2023
Author(s)
Charles S. Tarrio, Steven Grantham, Rob Vest, Thomas A. Germer, Bryan Barnes, Stephanie Moffitt, Brian Simonds, Matthew Spidell
For several decades, the National Institute of Standards and Technology (NIST) has actively supported metrology programs for extreme ultraviolet (EUV) lithography. We will describe our existing programs in optics lifetime, reflectometry, and radiometry

Oxidation caused by water outgassed from the thermal blanket on the SDO spacecraft

June 23, 2023
Author(s)
Robert F. Berg, Charles S. Tarrio, FRANCIS EPARVIER, ANDREW JONES
The Solar Dynamics Observatory (SDO) is a sun-observing spacecraft that includes two spectrometers that use aluminum membranes to filter solar radiation. The transmission of those filters degraded by a factor of 5 during the first five years after launch

Measurements and model of UV-induced oxidation of aluminum

March 22, 2023
Author(s)
Robert F. Berg, Charles S. Tarrio, Thomas B. Lucatorto
We present measurements and a model of aluminum oxidation induced by ultraviolet (UV) radiation. Spots of oxide were grown by focusing synchrotron radiation onto a polycrystalline aluminum membrane in the presence of water vapor at pressures from 3×10-8

The hazard of UV-induced oxidation to solar-viewing spacecraft optics

March 2, 2023
Author(s)
Charles S. Tarrio, Robert F. Berg, Thomas B. Lucatorto, Dale E. Newbury, Nicholas Ritchie, Andrew Jones, Frank Eparvier
The two most prevalent outgas contaminants on satellites are organic molecules and water vapor. Adsorbed organic molecules can degrade a solar-viewing instrument when they are cracked by ultraviolet radiation (UV) and become a light-absorbing layer of

Evidence Against Carbonization of the Thin-Film Filters of the Extreme Ultraviolet Variability Experiment onboard the Solar Dynamics Observatory

April 1, 2021
Author(s)
Charles Tarrio, Robert F. Berg, Thomas B. Lucatorto, Andrew Jones, Frank Eparvier, Brian Templeman, Donald Woodraska, Marie Dominique
In spite of strict limits on outgassing from organic materials, some spacecraft instruments making long-term measurements of solar extreme ultraviolet (EUV) radiation still suff er signi cant degradation. While such measures have reduced the rate of

Optics Contamination

February 5, 2018
Author(s)
Charles S. Tarrio, Shannon B. Hill, Robert F. Berg, Sasa Bajt

Thermally stable thin-film filters for high-power extreme-ultraviolet applications

November 12, 2015
Author(s)
Charles S. Tarrio, Robert F. Berg, Thomas B. Lucatorto, Bruce Lairson, Heidi Lopez, Travis Ayers
We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm-2, Ni-mesh-backed Zr filters have a typical lifetime of 20 hours, at which

Development and evaluation of interface-stabilized and reactive-sputtered oxide-capped multilayers for EUV lithography

March 16, 2015
Author(s)
Michael Kriese, Jim Rodriguez, Gary Fournier, Steven Grantham, Shannon B. Hill, John J. Curry, Charles Tarrio, Yuriy Platonov
A critical component of high-performance EUV lithography source optics is the reflecting multilayer coating. The ideal multilayer will have both high reflectance and high stability to thermal load. Additionally the capping layers must provide resistance to

Development of an EUVL collector with infrared radiation suppression

August 1, 2014
Author(s)
Steven E. Grantham, Mike Kriese, Yuriy Platonov, Bodo Ehlers, Licai Jiang, Jim Rodriguez, Mueller Ulrich, Shayna khatri, Adam Magruder, Charles S. Tarrio
Laser-produced plasma (LPP) sources for extreme ultraviolet lithography (EUVL) systems utilize CO2 lasers operating with wavelength 10.6μm. Since multilayer-coated optics have high reflectivity for this infrared radiation (IR), a significant and

Improved measurement capabilities at the NIST EUV Reflectometry Facility

August 1, 2014
Author(s)
Charles S. Tarrio, Steven E. Grantham, Thomas A. Germer, Jack C. Rife, Thomas B. Lucatorto, Mike Kriese, Yuriy Platonov, Licai Jiang, Jim Rodriguez
The NIST Extreme Ultraviolet (EUV) Reflectometry Facility was designed in the 1990s to accommodate the largest multilayer optics envisioned at that time. However, with increasing power requirements for an EUV scanner, source collection optics have grown