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Search Publications by: Wen-Li Wu (Assoc)

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Displaying 76 - 100 of 386

Thermodynamic Interactions in Double-Network Hydrogels

March 11, 2008
Author(s)
Taiki Tominaga, Vijay Tirumala, Sanghun Lee, Eric K. Lin, Jian P. Gong, Wen-Li Wu
Double-network hydrogels (DN-gels) prepared from the combination of a moderately crosslinked anionic polyelectrolyte and an uncrosslinked linear polymer solution exhibit mechanical properties such as fracture toughness that are intriguingly superior to

Characterization of the Latent Image to Developed Image in Model EUV Photoresists

February 22, 2008
Author(s)
John T. Woodward IV, Kwang-Woo Choi, Vivek Prabhu, Shuhui Kang, Kristopher Lavery, Wen-Li Wu, Michael Leeson, Anuja De Silva, Nelson Felix, Christopher K. Ober
Current extreme ultraviolet (EUV) photoresist materials do not yet meet exposure-dose sensitivity, line-width roughness, and resolution requirements. In order to quantify how trade-offs are related to the materials properties of the resist and processing

The Molecular Origin of Enhanced Toughness in Double-Network Hydrogels

October 22, 2007
Author(s)
Taiki Tominaga, Vijay Tirumala, Eric K. Lin, Jian P. Gong, Hidemitsu Furukawa, Yoshihito Osada, Wen-Li Wu
The long-standing pursuit of a synthetic equivalent to tissue cartilage has seen significant new activity with the development of a new materials strategy: double-network hydrogels (DN-gels) prepared from a combination of an anionic polyelectrolyte and a

Effect of Photoacid Generator Concentration and Developer Strength on the Patterning Capabilities of a Model EUV Photoresist

February 25, 2007
Author(s)
Kwang-Woo Choi, Vivek Prabhu, Kristopher Lavery, Eric K. Lin, Wen-Li Wu, John T. Woodward IV, Michael Leeson, H Cao, Manish Chandhok, George Thompson
Current extreme ultraviolet (EUV) photoresist materials do not yet meet requirements on exposure-dose sensitivity, line-width roughness (LWR), and resolution. Fundamental studies are required to quantify the trade-offs in materials properties and

Evaluation of the 3D Compositional Fluctuation Effect on Line-Edge-Roughness

February 25, 2007
Author(s)
Shuhui Kang, Wen-Li Wu, B D. Vogt, Vivek Prabhu, Eric K. Lin, Karen Turnquest
Line-edge-roughness (LER) and the relationship to resist processing and materials design is a critical problem for sub-65 nm photolithography. In this work we investigate how chemical composition fluctuations (heterogeneity) produced by the reaction

FTIR measurements of compositional heterogeneities

February 25, 2007
Author(s)
Shuhui Kang, B D. Vogt, Wen-Li Wu, Vivek Prabhu, David L. VanderHart, Ashwin Rao, Eric K. Lin, Karen Turnquest
A general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy has been demonstrated Polymer films with varying degrees of heterogeneity were prepared using a model chemically

Identifying Materials Limits of Chemically Amplified Photoresists

February 25, 2007
Author(s)
Wen-Li Wu, Vivek Prabhu, Eric K. Lin
Chemically amplified photoresists are likely to remain the primary imaging materials for the semiconductor industry. As feature sizes decrease to dimensions comparable to the characteristic size of the molecules in the photoresist, a significant challenge

Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy

February 9, 2007
Author(s)
Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, David L. VanderHart, Ashwin Rao, Karen Turnquest
We demonstrate a general approach to characterize compositional heterogeneity in polymer thin films using Fourier transform infrared (FTIR) spectroscopy. Polymer films with varying degrees of heterogeneity were prepared using a model chemically amplified