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Search Publications by: Daniel A Fischer (Fed)

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Displaying 151 - 175 of 230

Rapid Formation of Soft Hydrophilic Silicone Elastomer Surfaces

June 16, 2005
Author(s)
K Efimenko, J A. Crowe, E Manias, D W. Schwark, Daniel A. Fischer, Jan Genzer
We report on the rapid formation of hydrophilic silicone elastomer surfaces by ultraviolet/zone (UVO) irradiation of poly(vinylmethyl siloxane) (PVMS) network films. Our results reveal that the PVMS network surfaces render hydrophilic upon only a short UVO

Improvement in the Low Energy Collection Efficiency of Si(Li) X-Ray Detectors

April 7, 2005
Author(s)
C E. Cox, Daniel A. Fischer, W G. Schwarz, Y Song
Soft X-ray beam-line applications are of fundamental importance to material research, and commonly employ high-resolution Si(Li) detectors for Energy Dispersive Spectroscopy. However, the measurement of X-rays below 1 keV compromised by absorption in the

X-ray Absorption Spectroscopy to Probe Surface Composition and Surface Deprotection in Photoresist Films

March 1, 2005
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Ronald L. Jones, Christopher Soles, Wen-Li Wu, D M. Goldfarb, M Angelopoulos
We utilize near edge x-ray absorption fine structure spectroscopy (NEXAFS) to provide chemical insight into surface chemical effects in model photo-resist films. First, NEXAFS was used to examine the resist/air interface including surface segregration of a

Investigation of the Charge Compensation Mechanism on the Electrochemically Li-Ion Deintercalated Li 1-x Co 1/3 Ni 1/ 3MN 1/3 O 2 Electrode System by Combination of Soft and Hard X-Ray Absorption Spectroscopy

January 11, 2005
Author(s)
W S. Yoon, Kyung Y. Chung, Xiao-Qing Yang, James McBreen, Mahalingam Balasubramanian, C P. Grey, Daniel A. Fischer
In situ hard X-ray absorption spectroscopy (XAS) at metal K-edges and soft XAS at O K-edge and metal L-edges have been carried out during the first charging process for the layered Li1-2Co1/3Ni1/3Mn1/3O2 cathode material. The metal K-edge XANES results

Control of Surface Properties Using Fluorinated Polymer Brushes Produced by Surface-Initiated Controlled Radical Polymerization

November 1, 2004
Author(s)
L Andruzzi, A Hexemer, X Li, Christopher K. Ober, E K. Kramer, Giancarlo Galli, E Chiellini, Daniel A. Fischer
Surface-grafted styrene-based homopolymer and diblock copolymer brushes bearing semifluorinated alkyl groups were synthesized by nitroxide-mediated controlled radical polymerization on planar silicon oxide surfaces. The polymer brushes were characterized

In-Situ Soft X-Ray Studies of CO Oxidation on the Pt(111) Surface

August 1, 2004
Author(s)
D J. Burnett, A T. Capitano, A M. Gabelnick, A L. Marsh, Daniel A. Fischer, J L. Gland
Temperature programmed and isothermal fluorescence yield measurements have been used to characterize carbon monoxide oxidation on the Pt(111) surface for oxygen pressures from 0.027 Pa to 2.7 Pa over the 200 to 600 K temperature range. Carbon monoxide

In-situ Studies of CO Oxidation on Pt(111): Evidence of a Self-Limiting Reaction at 140 K

April 29, 2004
Author(s)
D J. Burnett, A M. Gabelnick, A T. Capitano, Daniel A. Fischer, J L. Gland
In-situ oxidation experiments in oxygen pressures up to 1.3 Pa indicate that the 140 K carbon monoxide oxidation process is self-limiting. This experimental data suggests that adsorbed atomic oxygen may be responsible for limiting the extent of reaction

Soft X-Ray Absorption Spectroscopic Study of a LiNi 0.5 Mn 0.5 O 2 Cathode During Charge

February 1, 2004
Author(s)
W S. Yoon, Mahalingam Balasubramanian, Xiao-Qing Yang, Ziwen Fu, Daniel A. Fischer, James McBreen
Soft X-ray (200 eV to 1000 eV) absorption spectroscopy (XAS) at the O K-edge and the metal L II, III-edges, in both the fluorescence yield (FY) and the partial electron yield (PEY) mode, has been used to probe the electronic structure of electrochemically

Surface Effects in Chemically Amplified Photoresists: Environmental Stability and Segregation

February 1, 2004
Author(s)
E Jablonski, Vivek M. Prabhu, S Sambasivan, Daniel A. Fischer, Eric K. Lin, D L. Goldfarb, M Angelopoulos, H Ito
It is well known that chemically amplified photoresists are sensitive to certain airborne molecular contaminants, notably amines, during post exposure delay, although the actual cause and specific failure mechanism are unknown. To assess the effect of low

In-situ Soft X-ray Studies of Toluene Catalytic Oxidation on the Pt(111) Surface

January 5, 2004
Author(s)
A L. Marsh, D J. Burnette, Daniel A. Fischer, J L. Gland
The catalytic oxidation of toluene on the Pt(111) surface has been characterized, in flowing oxygen pressures up to 1.33 Pa, using fluorescence yield near-edge spectroscopy (FYNES). During temperature-programmed (TP-FYNES) oxidationexperiments in flowing
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