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Displaying 2301 - 2325 of 2717

Rockwell Hardness - A Method-Dependent Standards Reference Material

July 1, 1999
Author(s)
Samuel Low, R Gettings, Walter S. Liggett Jr, Jun-Feng Song
Rockwell hardness is a method-dependent measurement of the deformation of a material in response to an applied force. It is not a fundamental physical property of a material. There are no alternative measurement systems to directly or independently measure

Voltage Modulation Scanned Probe Oxidation

July 1, 1999
Author(s)
F Perez-murano, K Birkelund, K Morimoto, John A. Dagata
Scanned probe microscope (SPM) oxidation with voltage modulation leads to a significant enhancement of the oxide growth rate, improvement of the aspect ratio of oxide features, and control of the structural and electrical properties of the SPM oxide

A Unique Institution: The History of NBS, 1950-1969

June 30, 1999
Author(s)
E Passaglia, K A. Beal
A follow-on to Measures for Progress by Rexmond C. Cochrane, this work covers the history of the National Bureau of Standards (NBS) from 1950-1969. While the book focuses on technical work, the management and administration of the Bureau are also discussed

Assessment Error Sources in Rockwell Hardness Measurements

June 1, 1999
Author(s)
Walter S. Liggett Jr, Samuel Low, David J. Pitchure, Jun-Feng Song
In the use of hardness test blocks, the uncertainty due to block non-uniformity can be reduced if one is willing to make measurements at specified locations on the blocks. Statistical methods for achieving this reduction are explained in this paper. The

Dimensional Metrology with the NIST Calibrated Atomic Force Microscope

June 1, 1999
Author(s)
Ronald G. Dixson, R Koning, V W. Tsai, Joseph Fu, Theodore V. Vorburger
Atomic force microscopes (AFMs) are increasingly used in the semiconductor industry as tools for submicrometer dimensional metrology. The scales of an AFM must be calibrated in order to perform accurate measurements. We have designed and developed the

Intercomparison of SEM, AFM, and Electrical Linewidths

June 1, 1999
Author(s)
John S. Villarrubia, Ronald G. Dixson, Samuel N. Jones, J R. Lowney, Michael T. Postek, Richard A. Allen, Michael W. Cresswell
Uncertainty in the locations of line edges dominates the uncertainty budget for high quality sub-micrometer linewidth measurements. For microscopic techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM), the image of the sharp

Measurement Traceability to NIST Standard Rockwell Diamond Indenters

June 1, 1999
Author(s)
Jun-Feng Song
A metrology-based Rockwell hardness scale is established by a standard machine and a standard diamond indenter. Both must be established through force and dimensional metrology with acceptably small measurement uncertainties. In 1994, NIST developed a

Measurement Uncertainity and Noise in Nanometrology

June 1, 1999
Author(s)
James E. Potzick
The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such

Optical Linewidth Models: Then and Now

June 1, 1999
Author(s)
Robert D. Larrabee, Richard M. Silver, M P. Davidson
In the late 1970's, Dr. Diana Nyyssonen demonstrated that NIST could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright-field microscope. She equated the known position of the

Telepresence: A New Paradigm for Industrial and Scientific Collaboration

June 1, 1999
Author(s)
Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec
A portion of the mission of the National Institute of Standards and Technology (NIST) Manufacturing Engineering Laboratory (MEL) is to improve and advance length metrology in aid of U.S. industry. The successful development of a Collaboratory for

Telepresence: A New Paradigm for Industrial and Scientific Collaboration

June 1, 1999
Author(s)
Michael T. Postek, Marylyn H. Bennett, N J. Zaluzec
The successful development of a collaboratory for Telepresence Microscopy (TPM) provides an important new tool to promote technology transfer in the areas of measurement technology. NIST and Texas Instruments (TI), under the auspices of the National

Toward Nanometer Accuracy Measurements

June 1, 1999
Author(s)
John A. Kramar, E Amatucci, David E. Gilsinn, Jay S. Jun, William B. Penzes, Fredric Scire, E C. Teague, John S. Villarrubia
We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneling

Two-Dimensional Calibration Artifact and Measurement Methodology

June 1, 1999
Author(s)
Richard M. Silver, Theodore D. Doiron, William B. Penzes, S Fox, Edward A. Kornegay, S Rathjen, M Takac, D Owen
In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank. The design has been agreed upon by a number of SEMI participants working on a two-dimensional

High Accuracy High Speed Gaussian Filter in Surface Metrology

May 31, 1999
Author(s)
Y B. Yuan, Jun-Feng Song, Theodore V. Vorburger
Both (1+x^2)^(-n) and (sin x/x)^n functions are very close to the Gaussian distribution for large value of n. Based on these functions, two new algorithms are developed for designing high accuracy and high speed recursive type Gaussian digital filters. The

Measurements and Predictions of Light Scattering by Coatings

May 1, 1999
Author(s)
Theodore V. Vorburger, Egon Marx, M E. McKnight, Maria Nadal, P Y. Barnes, Alan Keith Thompson, Michael Galler, Fern Y. Hunt, Mark R. VanLandingham
We show comparisons between calculations and measurements of angle-resolved light scattering distributions from clear dielectric, isotropic coatings. The calculated distributions are derived from topography measurements performed with scanning white light

The NIST Length Scale Interferometer

May 1, 1999
Author(s)
John S. Beers, William B. Penzes
The National Institute of Standards and Technology (NIST) interferometer for measuring graduated length scales has been in use since 1965. It was developed in response to the redefinition of the meter in 1960 from the prototype platinum-iridium bar to the

Improving Kinematic Touch Trigger Probe Performance

April 1, 1999
Author(s)
Steven D. Phillips, William T. Estler
Kinematic touch trigger probes are widely used on CMMs. This article gives CMM users advice on how to minimize the systematic errors associated with this class of probes.

Optical Linewidth Models - Then and Now

March 1, 1999
Author(s)
Robert D. Larrabee, Richard M. Silver, M P. Davidson
In the late 1970's Dr. Diana Nyyssonen demonstrated that the National Institute of Standards and Technology (NIST) could optically calibrate photomask linewidth standards that were narrower than the classical resolution limit of a conventional bright-field
Displaying 2301 - 2325 of 2717
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