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Displaying 58076 - 58100 of 74223

Critical Issues in Scanning Electron Microscope Metrology

January 1, 1994
Author(s)
Michael T. Postek
During the manufacturing of present-day integrated circuits, certain measurements must be made of the submicrometer structures composing the device with a high degree of repeatability. Optical microscopy, scanning electron microscopy, and the various forms
Displaying 58076 - 58100 of 74223
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