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Displaying 54151 - 54175 of 74189

Growth morphologies of heteroepitaxial rutile films on sapphire substrates

July 1, 1997
Author(s)
P. A. Morris-Hotsenpiller, Alexana Roshko, J. B. Lowekamp, G. S. Rohrer
The growth morphologies of (1 0 0), (1 0 1) and (0 0 1) rutile films grown on sapphire substrates by the ion-beam sputter deposition technique have been examined as a function of film/substrate orientation, film thickness, substrate surface preparation

Managing Tcl's Namespaces Collaboratively

July 1, 1997
Author(s)
Don E. Libes
The NIST Identifier Collaboration Service (NICS) is a proposed service to encourage collaboration among researchers and developers when choosing identifiers, far in advance of when it might ordinarily occur. This would support and enhance standards

Measurement of Heat Conduction Through Stacked Screens

July 1, 1997
Author(s)
T Kuriyama, F Kuriyama, Michael A. Lewis, Ray Radebaugh
This paper describes the experimental apparatus for the measurement of heat conduction through stacked screens as well as some experimental results taken with the apparatus. Screens are stacked in a fiberglass-epoxy cylinder, which is 24.4 mm in diameter

Microstuctural Characterization of Hardened Steel by Nondestructive Methods

July 1, 1997
Author(s)
P T. Purtscher, B Igarashi, Donna C. Hurley, K W. Hollman
This paper describes the application of a variety of methods to the nondesctructive characterization (NDC) of microstructure in hardened steels. The measurements include ultrasonic velocity, nonlinear ultrasonics, resonant ultrasonic spectroscopy (RUS)

Practical Aspects of Touch Trigger Probe Error Compensation

July 1, 1997
Author(s)
William T. Estler, Steven D. Phillips, Bruce R. Borchardt, Ted Hopp, M Levenson, K Eberhardt, Marjorie A. McClain
We present extensions of our prior work in modeling and correcting for pretravel variation errors in kinematic seat touch-trigger coordinate measuring machine (CMM) probes with straight styli. A simple correction term is shown to account for a range of

Statistical Measure for the Sharpness of the SEM Image

July 1, 1997
Author(s)
Nien F. Zhang, Michael T. Postek, Robert D. Larrabee
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an
Displaying 54151 - 54175 of 74189
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