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NIST Authors in Bold

Displaying 49876 - 49900 of 73697

Embedded Systems, The Forgotten Y2K Problem

June 1, 1999
Author(s)
G E. Fisher
Much has been written about embedded systems and how they will be affected by the year 2000 problem. During the first 6 months of 1999, a significant amount of conflicting information was spread about the outlook for fixing systems that rely on embedded

Grain Boundary Crack Growth in Interconnects With an Electric Current

June 1, 1999
Author(s)
C Y. Liu, S K. Lee, Tze J. Chuang
Failure of thin-film interconnects poses a great concern in semiconductor devices. Due to the high electric current density in interconnects, electromigration-induced atomic flux is recognized as an important failure mechanisms. For wide polycrystalline

Gray Calibration of Digital Cameras to Meet NIST Mugshot Best Practice

June 1, 1999
Author(s)
M Rubinfeld, Charles L. Wilson
A primary objective of any process of photography, electronic publishing, or printing is to reproduce all colors as perfectly as possible. A good starting point is to render a series of known shades of gray as accurately as possible. The goal of this

Interactions Between Bicrystal Josephson Junctions in a Multilayer Structure

June 1, 1999
Author(s)
H. Q. Li, Ronald H. Ono, Leila R. Vale, David A. Rudman, Sy-Hwang Liou
We have fabricated and studied a variety of devices based on stacked Yba 2Cu 3O x bicrystal Josephson junctions in a multilayer structure. The proximity of the junctions in the two layers produces a large number of effects based on interactions between the

Intercomparison of SEM, AFM, and Electrical Linewidths

June 1, 1999
Author(s)
John S. Villarrubia, Ronald G. Dixson, Samuel N. Jones, J R. Lowney, Michael T. Postek, Richard A. Allen, Michael W. Cresswell
Uncertainty in the locations of line edges dominates the uncertainty budget for high quality sub-micrometer linewidth measurements. For microscopic techniques like scanning electron microscopy (SEM) and atomic force microscopy (AFM), the image of the sharp

Internet-based Distributed Measurement and Control Applications

June 1, 1999
Author(s)
Kang B. Lee, Richard D. Schneeman
This paper describes research and development work conducted at the National Institute of Standards and Technology (NIST) on an Internet-based Distributed Measurement and Control (DMC) system. The work has resulted in applications that highlight state-of

Isochoric Heat Capacity Measurements for Binary Refrigerant Mixtures Containing Difluoromethane (R32), Pentafluoroethane (R125), 1,1,1,2-Tetrafluoroethane (R134a), and Trifluoroethane (R143a) From 200 to 345 K at Pressures ato 35 Mpa

June 1, 1999
Author(s)
Joe W. Magee
Molar heat capacities at constant volume C v were measured for binary refrigerant mixtures with an adiabatic colorimeter with gravimetric determinations of the amount of substance. Temperatures ranged from 200 to 345 K, while pressures extended up to 35

Isochoric p-rho-T and Heat Capacity Cv Measurements for Ternary Refrigerant Mixtures Containing Difluoromethane (R32), Pentafluoroethane (R125), and 1,1,1,2-Tetrafluoroethane (R134a) From 200 to 400 at Pressures to 35 MPa

June 1, 1999
Author(s)
Joe W. Magee
The p-p-T relationships and constant volume heat capacity C υ were measured fro ternary refrigerant mixtures by isochoric methods with gravimetric determinations of the amount of substance. Temperatures ranged from 200 to 400 K for p-p-T and from 203 to

Just How Perfect Can a Perfect Crystal Be?

June 1, 1999
Author(s)
R Deslattes, Ernest G. Kessler, S M. Owens, David R. Black, Albert Henins
This overview addresses certain aspects of the perfection of the current generation of commercially manufactured silicon, specifically lattice uniformity and the more complex issues of interstitials, vacancies, and chemical impurities. The application

Large Area YBa 2 Cu 3 O 7-x Bolometers on Si Substrates

June 1, 1999
Author(s)
Leila R. Vale, Ronald H. Ono, Donald G. McDonald, Robert J. Phelan
We have developed YBa 2Cu 3O 7-x (YBCO) thermometers for large-area (4 mm x 4 mm) electrical substitution bolometers. We passivated the YBCO with a thin Au layer and demonstrated a noise equivalent temperature of 4 nK Hz -1/2. We then used a resistor layer

Linux-Based Clusters at the National Institute of Standards and Technology

June 1, 1999
Author(s)
Wayne J. Salamon, Alan Mink
The Scalable Parallel Systems and Applications Group at the National Institute of Standards and Technology (NIST) has been experimenting with Linux-based clusters of computers. These clusters are used for both the running of computationally intensive

Long Term Stability of YBCO-Based Josephson Junctions

June 1, 1999
Author(s)
Leila R. Vale, Ronald H. Ono, J. Talvacchio, M. G. Forrester, B. D. Hunt, M. S. DiTorio, Ki Youl Yang, S. Yoshizumi
We report on a study of long term aging in three different types of Yba 2Cu 3O 7-x Josephson junctions. Junction aging will affect the choices made in integrating this technology with actual applications. The junction types used in this study are (a) Co

Lowering the Limit of Detection in High Spatial Resolution Electron Beam Microanalysis With the Microcalorimeter Energy Dispersive X-Ray Spectrometer

June 1, 1999
Author(s)
Dale E. Newbury, David A. Wollman, Kent D. Irwin, Gene C. Hilton, John M. Martinis
Low-beam-energy x-ray microanalysis with the field-emission-gun scanning electron microscope suffers limitations due to physical factors of x-ray generation. Instrumental limitations are imposed by the poor resolution of the conventional semiconductor

Mean-Field-Scaling in Lattice Boltzmann Fluid Mixtures

June 1, 1999
Author(s)
Nicos Martys, Jack F. Douglas
Basic equilibrium properties of Lattice Boltzmann (LB) fluid mixtures (coexistence curve, surface tension, and interfacial profile) are calculated to characterize the critical phenomena occurring in these model liquids and to establish a reduced variable

Measurement Traceability to NIST Standard Rockwell Diamond Indenters

June 1, 1999
Author(s)
Jun-Feng Song
A metrology-based Rockwell hardness scale is established by a standard machine and a standard diamond indenter. Both must be established through force and dimensional metrology with acceptably small measurement uncertainties. In 1994, NIST developed a

Measurement Uncertainity and Noise in Nanometrology

June 1, 1999
Author(s)
James E. Potzick
The measurement of feature sizes on integrated circuit photomasks and wafers is an economically important and technically challenging application of nanometrology. The displacement measuring laser heterodyne interferometer is a popular tool in such
Displaying 49876 - 49900 of 73697
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