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Displaying 42276 - 42300 of 73960

Scale-Space Analysis of Line Edge Roughness on 193 nm Lithography Test Structures

January 1, 2003
Author(s)
Ndubuisi G. Orji, Theodore V. Vorburger, Xiaohong Gu, Jayaraman Raja
Line edge roughness (LER) is a potential showstopper for the semiconductor industry. As the width of patterned line structures decreases, LER is becoming a non-negligible contributor to resist critical dimension (CD) variation. The International Technology

Scattering by Wedges

January 1, 2003
Author(s)
Egon Marx
Some of the components of the fields produced by an incident plane monochromatic wave scattered by a wedge diverge near the edge of the wedge. Rigorous solutions for the fields scattered by a perfectly conducting infinite wedge have been obtained, but this
Displaying 42276 - 42300 of 73960
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