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NIST Authors in Bold

Displaying 40726 - 40750 of 74095

Compact Solid-State Waveguide Lasers

September 1, 2003
Author(s)
Berton Callicoatt, John B. Schlager, Robert K. Hickernell, Richard Mirin, Norman Sanford
DBR and mode-locked Er/Yb waveguide lasers offer single-frequency and ultralow jitter performance.

Confinement Effects on Mositure Absorption Kinetics in Polyelectrolyte Films

September 1, 2003
Author(s)
B D. Vogt, Christopher L. Soles, Hae-Jeong Lee, Eric K. Lin, Wen-Li Wu
Quartz crystal microbalance (QCM) measurements were used to determine the absorption of water into thin poly(4-ammonium styrenesulfonic acid) films from saturated vapor at 25 C. The effect of film thickness on the absorption kinetics was investigated in

Conformational Analysis of the Jet-Cooled Peptide Mimetic Ethylacetamidoacetate from Torsion-Rotation Spectra

September 1, 2003
Author(s)
R J. Lavrich, Angela R. Hight Walker, David F. Plusquellic, I Kleiner, R D. Suenram, Jon T. Hougen, Gerald T. Fraser
Rotational spectra of two conformers of the dipeptide mimetic, ethyl acetamidoacetate, were measured in a molecular beam using a Fourier-transform microwave spectrometer. In each conformer, internal rotation of the acetyl methyl group gives rise to

Development of Metrology at NIST For the Semiconductor Industry

September 1, 2003
Author(s)
Stephen Knight
The National Institute of Standards and Technology metrology development for the semiconductor industry and its supporting infrastructure is a broad set of programs directed at many of the critical metrology needs. This paper will give examples of specific

Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools

September 1, 2003
Author(s)
Kenneth G. Kreider, D H. Chen, D P. DeWitt, William A. Kimes, Benjamin K. Tsai
Lightpipe radiation thermometers (LPRTs) are the preferred temperature monitoring sensor in most rapid thermal processing (RTP) tools for semiconductor fabrication. These tools are used for dopant anneal, gate oxide formation, and other high temperature

Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools

September 1, 2003
Author(s)
Kenneth G. Kreider, D H. Chen, D P. DeWitt, William A. Kimes, Benjamin K. Tsai
curate temperature measurements are critical in rapid thermal processing (RTP) of silicon wafers for thermal oxidation and dopant anneals. Many RTP tools use lightpipe radiation thermometers (LPRTs) to measure the wafer temperatures during processing

Elastic Stiffnesses, Debye Temperatures, and T c in Cuprates

September 1, 2003
Author(s)
H M. Ledbetter, K Sudook
For cuprate superconductors and related oxides, we review some aspects of their elastic constants. We consider the systematics of the bulk-modulus/atomic-volume (B/V a) relationship. For nonsuperconducting oxides, the B-V a diagram shows that most oxides

Evaluation of Operator Interventions in Autonomous Off-Road Driving

September 1, 2003
Author(s)
Jean C. Scholtz, Brian Antonishek, J D. Young
We participated in field trials of a semi-autonomous vehicle. This gave us an opportunity to collect data on operator interventions. In this paper we present an analysis of why and how operators intervene and examine the efficiency of these interventions.

Expanding Definitions of Gain by Taking Harmonic Content into Account

September 1, 2003
Author(s)
Jeffrey Jargon, Kuldip Gupta, Alessandro Cidronali, Donald C. DeGroot
We expand the definitions of power gain, transducer gain, and available gain by taking harmonic content into account. Furthermore, we show that under special conditions, these expanded definitions of gain can be expressed in terms of nonlinear large-signal

Fast Evaluation of Next-Generation Lithographical Patterns by Small Angle X-Ray Scattering

September 1, 2003
Author(s)
T Hu, Ronald L. Jones, Wen-Li Wu, Christopher L. Soles, Eric K. Lin, M Arpan, D M. Casa
As the semiconductor industry moves to next-generation lithographies, evaluation of the patterns is more stringent. We demonstrate the capability of small angel X-ray scattering in a fast evaluation of periodicity, size of the patterns, average profile of

Form of Deprotection in Chemically Amplified Resists

September 1, 2003
Author(s)
Ronald L. Jones, T J. Hu, Vivek M. Prabhu, Christopher L. Soles, Eric K. Lin, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
The push to mass production of patterns with sub-100 nm dimensions will require nanometer level control of feature size, including line edge roughness (LER). Control of LER and sidewall roughness within the length scale of individual molecules requires a

Frequency dependence of capacitance standards

September 1, 2003
Author(s)
Yicheng Wang
We measured the frequency dependence of a 10 pF transportable fused-silica capacitor from 50 Hz to 20 kHz. The results have a relative standard uncertainty of 0.32x10^(-6), 0.15x10^(-6), and 0.37x10(-6) at 100 Hz, 400 Hz, and 20 kHz, respectively. This

High-Throughput Measurements of Polymer Adhesion and Mechanical Properties

September 1, 2003
Author(s)
Christopher Stafford, Aaron M. Forster, C Harrison, Cher H. Davis, Eric J. Amis, Alamgir Karim
Polymer adhesion is important to numerous technologies including electronic packaging, coatings and paints, biomedical implants, and pressure-sensitive adhesives. The challenge is to understand the fundamental driving forces for the development of adhesive

High-Throughput Milli-Fluidic Platform for Polymer Formulations

September 1, 2003
Author(s)
Kathryn L. Beers, J Cabral, H J. Walls, Alamgir Karim, Eric J. Amis, C Harrison
Rapid prototyping of microfluidic handling devices has gained in popularity due to the ability to quickly test and modify new design features several times in one day.8-13 While elastomer-based methods have dominated the literature and are remarkably well
Displaying 40726 - 40750 of 74095
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