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Displaying 36976 - 37000 of 74045

Optical frequency / wavelentgh references

April 25, 2005
Author(s)
Leo W. Hollberg, Christopher W. Oates, G Wilpers, C Hoyt, Zeb Barber, Scott A. Diddams, W Oskay, James C. Bergquist
Ideas for using visible light from atomic transitions for precision instrumentation and metrology go back at least to the 1800's. There are several good reasons to use optical frequencies, and with the scientific and technological advances of the last

Mobility Open Architecture Simulation and Tools Environment

April 21, 2005
Author(s)
Stephen B. Balakirsky, Christopher J. Scrapper Jr, Elena R. Messina
This paper will describe the Mobility Open Architecture Tools and Simulation (MOAST) environment. This environment conforms to the NIST 4D/RCS architecture [3] and allows simulated and real architectural components to function seamlessly in the same system

The Contribution of HfO2 Bulk Oxide Traps to Dynamic NBTI in pMOSFETs

April 20, 2005
Author(s)
Baozhong Zhu, John S. Suehle, Eric M. Vogel, Joseph B. Berstein
NBTI of HfO2 and SiO2 devices are studied and compared. The pulsed stress frequency responses of DVth and acceleration parameters are quite different for them. Bulk traps in the HfO2 film are used to explain these differences. Furthermore, caution must be

Comparison of SEM and HRTEM CD-Measurements Extracted from Monocrystalline Tes-Structures Having Feature Linewidths from 40 nm to 240 nm

April 18, 2005
Author(s)
Michael W. Cresswell, Brandon Park, Richard A. Allen, William F. Guthrie, Ronald G. Dixson, Wei Tan, Christine E. Murabito
CD measurements have been extracted from SEM and HRTEM images of the same set of monocrystalline silicon features having linewidths between 40 and 200 nm. The silicon features are incorporated into a new test structure which has been designed to facilitate

Laser Cooling Transitions in Atomic Erbium

April 18, 2005
Author(s)
H Ban, M Jacka, James L. Hanssen, Joseph Reader, Jabez J. McClelland
We discuss laser cooling opportunities in atomic erbium, identifying five J rarr} J + 1 transitions from the 4f 126s 2 3H 6 ground state that are accessible to common visible and near-infrared continuous-wave tunable lasers. We present lifetime

Nanometrology - FY 2004 Programs and Selected Accomplishments

April 15, 2005
Author(s)
C M. Allocca
The MSEL Nanometrology Program incorporates basic measurement metrologies to determine material properties, process monitoring at the nanoscale, nano-manufacturing and fabrication techniques, and structural characterization and analysis techniques, such as

Network Transfer of Control Data: An Application of the NIST Smart Data Flow

April 15, 2005
Author(s)
Martial Michel, Vincent M. Stanford, O P. Galibert
Pervasive Computing environments range from basic mobile point of sale terminal systems, to rich Smart Spaces with many devices and sensors such as lapel microphones, audio and video sensor arrays and multiple interactive PDA acting as electronic brief

Surface Engineering Measurement Standards for Inorganic Materials

April 14, 2005
Author(s)
S J. Dapkunas
The Recommended Practice Guide describes nearly 200 standard measurement methods (standards) used by the surface engineering community. The standards compiled address inorganic (metal and ceramic) materials used in structural applications. The Guide is

TRC Thermodynamic Tables - Hydrocarbons, Supplement 129, 2005

April 11, 2005
Author(s)
Michael D. Frenkel
1. Table 23-2-(1.21170)-db - Page db-1696.0 New table for 2,2,4,4,6,8,8-heptamethylnonane containing the density for the real fluid at selected temperatures and pressures. 2. Table 23-2-(1.12410)-db - Pages db-1720.0 and db-1720.1 New tables for nonadecane

Application of Combinatorial Methods for the Testing of Adhesives

April 10, 2005
Author(s)
Christopher M. Stafford
This presentation will focus on the development and application of novel high-throughput platforms for both adhesion and mechanical property testing. For screening of commercial pressure sensitive adhesives, we are applying C&HT tools to conventional peel

The Programs of the Manufacturing Engineering Laboratory 2005

April 8, 2005
Author(s)
Lisa J. Fronczek, Bessmarie A. Young
The National Institute of Standards and Technology s Manufacturing Engineering Laboratory (MEL) strengthens the U.S. economy and improves the quality of life by working with the U.S. manufacturing industry to develop and apply infrastructural technology

Improvement in the Low Energy Collection Efficiency of Si(Li) X-Ray Detectors

April 7, 2005
Author(s)
C E. Cox, Daniel A. Fischer, W G. Schwarz, Y Song
Soft X-ray beam-line applications are of fundamental importance to material research, and commonly employ high-resolution Si(Li) detectors for Energy Dispersive Spectroscopy. However, the measurement of X-rays below 1 keV compromised by absorption in the

Photomask Feature Metrology

April 7, 2005
Author(s)
James E. Potzick
This chapter discusses some general issues with regard to measurement of the size and placement of the features on a photomask.
Since all linewidth and placement measurements derive from the location of a feature's edges, the Chapter starts with a

Reaction gas chromatography/mass spectrometry. 2the use of catalytic on-line dehydrogenation for the investigation of alcohols by gas chromatography/mass spectrometry

April 7, 2005
Author(s)
Anzor I. Mikaia, Vladimir Smetanin, Vladimir G. Zaikin, Alla V. Antonova, Nikolay A. Prostakov
A GC-MS method is developed for structure determination of aliphatic within mixtures. It involves online application of a gas-phase dehydrogenation reaction after GC separation and before MS analysis. Primary and secondary alcohols are converted into

Elastic-property measurements of ultrathin films using atomic force acoustic microscopy

April 5, 2005
Author(s)
Malgorzata Kopycinska-Mueller, Roy H. Geiss, Jens Mueller, Donna C. Hurley
Atomic force acoustic microscopy (AFAM), an emerging technique that affords nanoscale lateral and depth resolution, was employed to measure the elastic properties of ultrathin films. In this study we measured the indentation modulus M of three nickel films

Microfabricated atomic frequency references

April 5, 2005
Author(s)
John Kitching, Svenja A. Knappe, Li-Anne Liew, John Moreland, Hugh Robinson, P Schwindt, V Shah, Leo W. Hollberg
We describe a design for a microfabricated atomic frequency reference with a volume of several cubic millimetres and a power dissipation in the range ot tens of milliwatts. It is anticipated that this frequency reference will be capable of achieving a
Displaying 36976 - 37000 of 74045
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