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NIST Authors in Bold

Displaying 8001 - 8025 of 13219

Rapid and precise absolute distance measurements at long range

June 1, 2009
Author(s)
Ian R. Coddington, William C. Swann, Ljerka Nenadovic, Nathan R. Newbury
… sensing. High precision ranging has important applications in both large-scale manufacturing and in future tight formation-flying satellite missions, where …

MATERIALS SCIENCE: Nanoscale Polymer Processing

October 31, 2008
Author(s)
Christopher L. Soles, Yifu Ding
… Plastics are ubiquitous in our modern world. It difficult to find a manufactured … some sort polymeric (plastic) components. This ubiquity, in large part, reflects the ease with which polymers can be …

Contact Induced Crystallinity for High Performance Soluble Acene-Based TFTs

February 17, 2008
Author(s)
David J. Gundlach, James Royer, Behrang Hamadani, Lucile C. Teague, Andrew J. Moad, Oana Jurchescu, Oleg A. Kirillov, Lee J. Richter, James G. Kushmerick, Curt A. Richter, Sungkyu Park, Thomas Jackson, Sankar Subramanian, John E. Anthony
… limits the potential for the significant reductions to manufacturing costs which are viewed as critical to …

Altering the mechanical properties of Sn films by alloying with Bi: mimicking the effect of Pb to suppress whiskers

December 29, 2007
Author(s)
Nitin Jadhav, Maureen E. Williams, Fei Pei, Gery R. Stafford, Eric Chason
… to be the main driving force for whisker formation in Sn coatings on Cu. This suggests that whiskering can be suppressed by promoting stress relaxation in the Sn layer, as is the case with Sn-Pb alloys. However, the need to remove Pb from electronics manufacturing requires finding an alternative alloying …

Fab-wide Network Time Synchronization - Simulation and Analysis

September 28, 2007
Author(s)
Naveen Kalappa, Vinod Anandarajah, Julien L. Baboud, Ya-Shian Li-Baboud, James Moyne
… In today?s fabs, coordination of time-based information … subsystems is seen as a cause for poor data quality in Interface A and Advanced Process Control (APC) analysis. … semiconductor factory environment to meet next generation manufacturing requirements. To this end, we describe the …

Fundamental Limits of Optical Critical Dimension Metrology: A Simulation Study

January 1, 2007
Author(s)
Richard M. Silver, Thomas A. Germer, Ravikiran Attota, Bryan M. Barnes, B Bunday, J Allgair, Egon Marx, Jay S. Jun
… process stacks and geometries representing semiconductor manufacturing nodes from the 45 nm node to the 18 nm node … combinations of intensity and polarization. It is apparent in the results that large differences are observed between …

Representation of Heterogeneous Material Properties in the Core Product Model

June 1, 2006
Author(s)
Arpan Biswas, Steven J. Fenves, V Shapiro, Ram D. Sriram
… product related information, to support data exchange, in a distributive and a collaborative environment. In this paper, we extend the CPM to components with … and popular due to progress in design, analysis and manufacturing techniques. The key enabling concept for …

Implementing Electronic Materials Data Exchange

August 18, 2005
Author(s)
Eric D. Simmon, Arthur Griesser
… takes the participants from the original data models used in the development of the IPC-175X standards and explains, in layman's terms, the techniques used to facilitate a smooth … system. The discussions are a must for anyone caught in the concepts of defining a strategy for data capture and …

Simple Test Procedure for Image-Based Biometric Verification Systems

May 1, 1999
Author(s)
Charles L. Wilson, R. McCabe
… login system is used as an example of the process used in this test method. Ideally, these tests should be performed … of image quality of the input sensor to be evaluation in the typical working environment where the system is to be …

Conformance Testing Object-Oriented Frameworks Using JAVA

October 1, 1998
Author(s)
Kevin G. Brady, James A. St Pierre
… effort between NIST and SEMATECH, 1994 to 1997, in support of the development of the SEMATECH Computer Integrated Manufacturing (CIM) Framework [CIMF]. SEMATECH 1 had the … specification development, and asked NIST to assist in this task. Although this initial implementation was …

Conformance Testing Object-Oriented Frameworks Using JAVA

July 1, 1998
Author(s)
Kevin G. Brady, James A. St Pierre
… effort between NIST and SEMATECH, 1994 to 1997, in support of the development of the SEMATECH Computer Integrated Manufacturing (CIM) Framework [CIMF].  SEMATECH 1 had the … specification development, and asked NIST  to assist in this task.  Although this initial implementation was …

Security in Open Systems

July 1, 1994
Author(s)
Robert H. Bagwill, John Barkley, Lisa J. Carnahan, Shu-jen H. Chang, David R. Kuhn, Paul Markovitz, Anastase Nakassis, Karen J. Olsen, Michael L. Ransom, John P. Wack
… the federal government are concerned that vulnerabilities in the PSN could be exploited and result in disruptions or degradation of service. To address these … of the Manager, National Communications System (OMNCS), in the areas of computer and network security research and …

An Instrument for Calibrating Atomic Force Microscope Standards

May 1, 1994
Author(s)
J Schneir, T Mcwaid, Theodore V. Vorburger
… To facilitate the use of AFMs for manufacturing we have initiated a project to develop and calibrate artifacts which can in turn be used to calibrate a commercial AFM so that … critical electromechanical and metrology issues involved in the construction and operation of such a system are …

In IoT We Trust?

July 13, 2018
Author(s)
Jeff Voas, D. Richard Kuhn, Phillip Laplante
… In this short article, we review an abbreviated list of trust … adoption transforms the IoT into another ubiquitous technology just as the Internet is. These challenges are in no specific order, and are by no means a full set. … In IoT We Trust? …

A Tool Kit for Implementing XML Schema Naming and Design Rules

September 1, 2005
Author(s)
Joshua Lubell, Boonserm Kulvatunyou
… being developed at the National Institute of Standards and Technology (NIST)encodes XML schema Naming and Design Rules in a computer-interpretable fashion,enabling automated rule …

Web-Based System for Design Artifact Modeling

July 1, 2000
Author(s)
Simon Szykman, J Racz, Christophe Snowden, Ram D. Sriram
… industry is relying more and more on the use of knowledge in product development. The NIST-Design Repository Project, … technologies to support the use of design repositories in industry. …

Cryptographic Standards in a Post-Quantum Era

November 2, 2022
Author(s)
Dustin Moody, Angela Robinson
… security of many commonly used cryptographic algorithms. In response, the National Institute of Standards and Technology is in the process of standardizing new cryptographic algorithms … Cryptographic Standards in a Post-Quantum Era …
Displaying 8001 - 8025 of 13219
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