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Displaying 14851 - 14875 of 17286

Two-Dimensional Calibration Artifact and Measurement Methodology

June 1, 1999
Author(s)
Richard M. Silver, Theodore D. Doiron, William B. Penzes, S Fox, Edward A. Kornegay, S Rathjen, M Takac, D Owen
In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank. The design has been agreed upon by a number of SEMI participants working on a two-dimensional

The NIST Design Repository Project

March 1, 1999
Author(s)
Simon Szykman, Ram D. Sriram, Christophe Bochenek, J Racz
… knowledge. This paper describes the National Institute of Standards and Technology (NIST) Design Repository Project, an …

A System to Measure Current Transducer Performance

July 1, 1998
Author(s)
Bryan C. Waltrip, Thomas L. Nelson
A special purpose ac current transducer measurement system capable of intercomparing transducers with ac output voltage ratios from 1:1 to 50:1 has been developed to extend the range and accuracy of current transformer, current shunt, and mutual inductor

Assessment of Color Measurement Systems Using Interference Filters

July 1, 1998
Author(s)
Paul A. Boynton, Eric Kelley
Spectroradiometers and tristimulus colorimeters are used in display measurements to measure color in one of several color space coordinate systems. How well these instruments can measure the color coordinates can be simply checked by using interference

Process Effects on White Layer Formation in Hard Turning

January 1, 1998
Author(s)
Y K. Chou, Christopher J. Evans
This paper discusses surface microstructural alterations in hard turned steels. A metallurgically unetchable structure, called white layer?, followed by a dark etching layer has been found on AISI 52100 steel surfaces machined in a hardened state (60 Rc)

SFRF: Spatial Frequency Response Function Estimation Program

November 10, 1997
Author(s)
Thomas A. Germer, Clara C. Asmail
Measurements of optical scatter are often employed in production line diagnostics for surface roughness of silicon wafers. However, the geometry of the optical scatter instrumentation lacks universal standardization, making it difficult to compare values
Displaying 14851 - 14875 of 17286
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