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NIST Authors in Bold

Displaying 3426 - 3450 of 4199

Ceramic Materials and Powder Diffraction

September 15, 2019
Author(s)
Winnie K. Wong-Ng
… exhibit similar features during processing and manufacturing (sintering and grain growth, texture, residual …

Model of Mobile Manipulator Performance Measurement using SysML

November 3, 2017
Author(s)
Roger V. Bostelman, Sebti Foufou, Tsai H. Hong, Mili Shah
Test methods for measuring safety and performance of mobile manipulators have yet to be developed. Therefore, potential mobile manipulator users cannot compare one system to another. Systems Modeling Language (SysML) is a general-purpose modeling language

Framework for Cyber-Physical Systems: Volume 3, Timing Annex

September 28, 2017
Author(s)
David A. Wollman, Marc A. Weiss, YaShian Li-Baboud, Edward R. Griffor, Martin J. Burns
… across multiple smart application domains, including smart manufacturing, transportation, energy, and healthcare. The …

Chapter 12 Depth profiling

September 17, 2017
Author(s)
Thomas M. Wallis, Pavel Kabos
… in materials, fault detection in construction and manufacturing, and the detection of hidden objects at secure …

A compact, thermal noise limited reference cavity for ultra-low noise microwave generation

March 23, 2017
Author(s)
Josue Davila-Rodriguez, Frederick N. Baynes, Andrew D. Ludlow, Tara M. Fortier, Holly F. Leopardi, Scott A. Diddams, Franklyn J. Quinlan
A 25 mm long, rigidly-held, ultra-stable optical frequency reference cavity is demonstrated. The cavity spacer has an easy-to-manufacture cylindrical shape which nonetheless exhibits a holding geometry predicted to be first-order insensitive to the

Enviromental Concerns Facing the Ceramics Industry

February 19, 2017
Author(s)
Stephen W. Freiman
Over the past few years, there has been increased attention paid by ceramic manufacturers in the United States to environmental issues facing their businesses. In a recent survey of its members, the environment was identified as the primary issue facing

Vector-Network-Analyzer Calibration Using Line and Multiple Coplanar-Waveguide Offset Reflects

December 9, 2016
Author(s)
Arkadiusz C. Lewandowski, Wojciech Wiatr, Dazhen Gu, Nate Orloff, Thomas Mitchell (Mitch) Wallis, Pavel Kabos
We present the application of our newly developed multi-reflect-thru technique to vector-network-analyzer calibration in the on-wafer environment. This technique uses a set of highly-reflective one-port devices, referred to as offset-reflects, and a single

Geometric Interoperability via Queries

May 19, 2014
Author(s)
Vijay Srinivasan
… many common geometric tasks in computer aided design and manufacturing, including model acquisition and exchange, …

Technical Note on Unexpected Bias in NIST 4p Ionization Chamber Measurements

April 4, 2012
Author(s)
Michael P. Unterweger, Ryan P. Fitzgerald
The NIST 4π pressurized ionization chamber “A” (PIC “A”) has been the mainstay for secondary calibrations of liquid and gaseous gamma-ray emitting sources for the last 40-45 years. It has also been the main instrument used to measure the half-lives of
Displaying 3426 - 3450 of 4199
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